Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Carbon Monoxide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Monoxide SCHEMBL3287009 | 0.95 | — | — | |
| Carbon Monoxide SCHEMBL3287828 | 0.95 | — | — | |
| Carbon Monoxide SCHEMBL3290235 | 0.95 | — | — | |
| Carbon Monoxide SCHEMBL3292538 | 0.95 | — | — | |
| SCHEMBL29009396 | 0.73 | — | — | |
| SCHEMBL28767735 | 0.72 | — | — | |
| Carbon Monoxide SCHEMBL2514732 | 0.68 | — | — | |
| Carbon Monoxide SCHEMBL2508232 | 0.68 | — | — | |
| Carbon Monoxide SCHEMBL8660758 | 0.68 | — | — | |
| Carbon Monoxide SCHEMBL2517336 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7718228-B2 | Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same | JSR CORPORATION (JP) | 2010-05-18 | — | — | US | claimed |
| CN-116987125-A | Cobalt-containing complex and preparation method and application thereof | 南京大学 | 2023-11-03 | — | — | CN | disclosed |
| US-7718228-B2 | Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same | JSR CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20070077742-A1 | Composition for forming silicon-cobalt film, silicon-cobalt film and method forming same | JSR CORPORATION (JP) | 2007-04-05 | — | — | US | disclosed |