Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | RAB9A | P51151 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | RGS12 | O14924 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | RAD52 | P43351 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL4222866 | 0.98 | MEN1 (0.31) | HTTMEN1KMT2AKDM4ENPC1 | |
| Iodide SCHEMBL4267896 | 0.98 | NPC1 (0.34) | HTTMEN1KMT2AKDM4ENPC1 | |
| SCHEMBL4227897 | 0.94 | KMT2A (0.38) | HTTMEN1KMT2AKDM4ENPC1 | |
| SCHEMBL4230747 | 0.92 | KMT2A (0.41) | HTTMEN1KMT2AKDM4ENPC1 | |
| SCHEMBL902005 | 0.92 | KMT2A (0.41) | HTTMEN1KMT2AKDM4ENPC1 | |
| Hydrochloric Acid SCHEMBL4233269 | 0.92 | SMN1; SMN2 (0.37) | HTTMEN1KMT2AKDM4ENPC1 | |
| Hydrochloric Acid SCHEMBL4227985 | 0.91 | SMN1; SMN2 (0.40) | HTTMEN1KMT2AKDM4ENPC1 | |
| Hydrochloric Acid SCHEMBL13274432 | 0.91 | SMN1; SMN2 (0.40) | HTTMEN1KMT2AKDM4ENPC1 | |
| SCHEMBL4233917 | 0.88 | — | — | |
| SCHEMBL4366351 | 0.86 | HRH3 (0.32) | HTTMEN1KMT2AKDM4ENPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3207013-A1 | METHOD FOR SEPARATING HF FROM HF/HALOGENATED HYDROCARBON MIXTURES USING IONIC LIQUIDS | Honeywell International Inc. (US) | 2017-08-23 | — | — | EP | claimed |
| EP-3127183-A1 | A METHOD FOR PASSIVE METAL ACTIVATION AND USES THEREOF | Technion Research & Development Foundation Ltd. (IL) | 2017-02-08 | — | — | EP | claimed |
| EP-3057928-A1 | PROCESS FOR PRODUCING 1-CHLORO-3,3,3-TRIFLUOROPROPENE IN AN IONIC LIQUID | Honeywell International Inc. (US) | 2016-08-24 | — | — | EP | claimed |
| WO-2016061294-A1 | METHOD FOR SEPARATING HF FROM HF/HALOGENATED HYDROCARBON MIXTURES USING IONIC LIQUIDS | HONEYWELL INTERNATIONAL INC. (US) | 2016-04-21 | — | — | WO | claimed |
| US-20160107892-A1 | METHOD FOR SEPARATING HF FROM HF/HALOGENATED HYDROCARBON MIXTURES USING IONIC LIQUIDS | HONEYWELL INTERNATIONAL INC. (US) | 2016-04-21 | — | — | US | claimed |
| US-9272967-B2 | Process for producing 1-chloro-3,3,3-trifluoropropene in an ionic liquid | HONEYWELL INTERNATIONAL INC. (US) | 2016-03-01 | — | — | US | claimed |
| EP-2356182-B1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2015-05-06 | — | — | EP | claimed |
| WO-2015057476-A1 | PROCESS FOR PRODUCING 1-CHLORO-3,3,3-TRIFLUOROPROPENE IN AN IONIC LIQUID | HONEYWELL INTERNATIONAL INC. (US) | 2015-04-23 | — | — | WO | claimed |
| US-20150105596-A1 | PROCESS FOR PRODUCING 1-CHLORO-3,3,3-TRIFLUOROPROPENE IN AN IONIC LIQUID | SOLSTICE ADVANCED MATERIALS US, INC. | 2015-04-16 | — | — | US | claimed |
| US-8946442-B2 | Foamed ionic compounds | E I DU PONT DE NEMOURS AND COMPANY (US) | 2015-02-03 | — | — | US | claimed |
| US-20130299736-A1 | RADIATION-CURABLE COATING MATERIALS | BASE SE (DE) | 2013-11-14 | — | — | US | claimed |
| US-20110230617-A1 | RADIATION-CURABLE COATING MATERIALS | BASF SE (DE) | 2011-09-22 | — | — | US | claimed |
| EP-2356182-A1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2011-08-17 | — | — | EP | claimed |
| WO-2010055050-A1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2010-05-20 | — | — | WO | claimed |
| WO-2009102419-A2 | ALUMINUM RECOVERY PROCESS | THE UNIVERSITY OF ALABAMA (US) | 2009-08-20 | — | — | WO | claimed |
| WO-2008058885-A2 | RADIATION-HARDENABLE COATING MASSES | BASF SE (DE) | 2008-05-22 | — | — | WO | claimed |
| EP-1663921-B1 | METHOD FOR PRODUCING HALOALKANES FROM ALCOHOLS | BASF AG (DE) | 2007-05-02 | — | — | EP | claimed |
| CN-119255857-A | Low viscosity metal ion containing liquids | 切弗朗菲利浦化学公司 | 2025-01-03 | — | — | CN | disclosed |
| EP-1372807-A2 | IONIC LIQUIDS AS SELECTIVE ADDITIVES FOR THE SEPARATION OF CLOSE-BOILING OR AZEOTROPIC MIXTURES | BASF AKTIENGESELLSCHAFT (DE) | 2004-01-02 | — | — | EP | disclosed |
| WO-2002074718-A2 | IONIC LIQUIDS AS SELECTIVE ADDITIVES FOR THE SEPARATION OF CLOSE-BOILING OR AZEOTROPIC MIXTURES | BASF AKTIENGESELLSCHAFT (DE) | 2002-09-26 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110230617-A1 | RADIATION-CURABLE COATING MATERIALS | RAD51, MGMT, RAD54L | HTT 1046/4885MEN1 514/4885KMT2A 1219/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.