SCHEMBL3299266

SCHEMBL3299266

CCCN(CC=Cc1ccccc1)CCC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.62
KMT2A Q03164 2/20 0.62
BCHE P06276 2/20 0.52
KCNH2 Q12809 3/20 0.49
KDM4E B2RXH2 1/20 0.46
HTR2A P28223 4/20 0.43
NR1I2 O75469 1/20 0.43
DRD2 P14416 1/20 0.43
ADRA2C P18825 1/20 0.43
CNR1 P21554 1/20 0.43
SLC6A2 P23975 1/20 0.43
SLC6A4 P31645 1/20 0.43
ADRA1A P35348 1/20 0.43
OPRK1 P41145 1/20 0.43
SLC6A3 Q01959 1/20 0.43
EBP Q15125 1/20 0.43
SIGMAR1 Q99720 1/20 0.43
LMNA P02545 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2D6 P10635 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3299271 1.00 MEN1 (0.62) MEN1KMT2ABCHEKCNH2KDM4E
Water SCHEMBL31499005 0.98 MEN1 (0.60) MEN1KMT2ABCHEKCNH2KDM4E
Styrene SCHEMBL9658019 0.92 MEN1 (0.54) MEN1KMT2ABCHEKCNH2KDM4E
SCHEMBL3305915 0.89 KCNH2 (0.62) MEN1KMT2ABCHEKCNH2KDM4E
SCHEMBL3305918 0.89 KCNH2 (0.62) MEN1KMT2ABCHEKCNH2KDM4E
SCHEMBL9603183 0.86 KCNH2 (0.64) MEN1KMT2ABCHEKCNH2ACHE
SCHEMBL9223844 0.86 KCNH2 (0.64) MEN1KMT2ABCHEKCNH2ACHE
SCHEMBL9779285 0.86 KCNH2 (0.64) MEN1KMT2ABCHEKCNH2ACHE
SCHEMBL9779449 0.86 KCNH2 (0.64) MEN1KMT2ABCHEKCNH2ACHE
SCHEMBL3037072 0.84 MEN1 (0.61) MEN1KMT2AKCNH2KDM4EHTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5091122-A Using a tertiary amine or phosphine substituted polymer IDEMITSU KOSAN COMPANY, LTD. (JP) 1992-02-25 US claimed
US-8399594-B2 Blocked-isocyanate silicone resins DOW CORNING CORPORATION (US) 2013-03-19 US disclosed
CN-101611098-B Blocked isocyanate silicone resins DOW CORNING INC 2011-10-26 CN disclosed
US-20100093902-A1 Blocked-Isocyanate Silicone Resins DOW CORNING CORPORATION 2010-04-15 US disclosed
CN-101611098-A Blocked isocyanate silicone resins DOW CORNING CORPORATRION (US) 2009-12-23 CN disclosed
EP-2102286-A1 BLOCKED ISOCYANATE SILICONE RESINS Dow Corning Corporation (US) 2009-09-23 EP disclosed
EP-1961054-A2 A TRANSPARENT ELECTRODE FOR ORGANIC ELECTRONIC DEVICES General Electric Company (US) 2008-08-27 EP disclosed
WO-2008088492-A1 BLOCKED ISOCYANATE SILICONE RESINS DOW CORNING CORPORATRION (US) 2008-07-24 WO disclosed
US-20070167587-A1 Process for producing polymer with functional end KURARAY CO., LTD. (JP) 2007-07-19 US disclosed
WO-2007067407-A2 A TRANSPARENT ELECTRODE FOR ORGANIC ELECTRONIC DEVICES GENERAL ELECTRIC COMPANY (US) 2007-06-14 WO disclosed
EP-1721912-A1 PROCESS FOR PRODUCING POLYMER WITH FUNCTIONAL END KURARAY CO., LTD. (JP) 2006-11-15 EP disclosed
US-6323370-B1 Catalytic process JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) 2001-11-27 US disclosed
EP-1078915-A1 Reductive amination process using a homogeneous iridium catalyst JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) 2001-02-28 EP disclosed
US-5075197-A Water based polymer dispersion FUJI PHOTO FILM CO., LTD. (JP) 1991-12-24 US disclosed
US-5015551-A Resin particles dispersed in a dielectric nonaqueous solvent for making printing plates or sheets FUJI PHOTO FILM CO., LTD. (JP) 1991-05-14 US disclosed
US-4734351-A DISPERSION OF POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1988-03-29 US disclosed
US-4473630-A Liquid developer comprising aminoalkyl styrene polymer for electrostatic images FUJI PHOTO FILM CO., LTD. (JP) 1984-09-25 US disclosed