Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 3/20 | 0.48 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
| ▸ | PPARA | Q07869 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.34 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5091290 | 0.88 | SLC6A2 (0.48) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL6864777 | 0.85 | SLC6A2 (0.50) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL3528108 | 0.75 | SLC6A2 (0.58) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL6889501 | 0.74 | SLC6A2 (0.52) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL8398942 | 0.73 | SLC6A2 (0.56) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| Ammonia Solution, Strong SCHEMBL28028790 | 0.73 | SLC6A2 (0.56) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL10830666 | 0.71 | SLC6A2 (0.67) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL10542458 | 0.70 | SLC6A2 (0.52) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL22730168 | 0.69 | TAAR1 (0.42) | SLC6A2TAAR1LMNACYP2D6TRPA1 | |
| SCHEMBL347187 | 0.69 | SLC6A2 (0.64) | SLC6A2TAAR1LMNACYP2D6TRPA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100093021-A1 | Hardening of ordered films of silica colloids | THE ARIZONA BD OF REG ON BEHALF OF THE UNIV OF AZ (US) | 2010-04-15 | — | — | US | disclosed |
| US-20070254161-A1 | HARDENING OF ORDERED FILMS OF SILICA COLLOIDS | THE ARIZONA BD OF REG ON BEHALF OF THE UNIV OF AZ (US) | 2007-11-01 | — | — | US | disclosed |
| US-7144968-B2 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED (JP) | 2006-12-05 | — | — | US | disclosed |
| US-20050038216-A1 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED | 2005-02-17 | — | — | US | disclosed |
| US-6709799-B2 | Resist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-03-23 | — | — | US | disclosed |
| US-6541077-B1 | Negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer | FUJITSU LIMITED (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020120058-A1 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | FUJITSU LIMITED | 2002-08-29 | — | — | US | disclosed |
| US-6342562-B1 | POLYSILICATE MODIFIED WITH ALKYLCARBOXY SILOXANE; AMPLIFICATION; PHOTORESIST | FUJITSU LIMITED (JP) | 2002-01-29 | — | — | US | disclosed |
| US-20010018161-A1 | Photosensitive resin for photolithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-30 | — | — | US | disclosed |