⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13551146 | 0.82 | — | — | |
| SCHEMBL17796888 | 0.80 | — | — | |
| SCHEMBL15350348 | 0.77 | — | — | |
| SCHEMBL2225837 | 0.77 | — | — | |
| SCHEMBL7777031 | 0.77 | — | — | |
| SCHEMBL8936492 | 0.74 | — | — | |
| SCHEMBL700675 | 0.73 | — | — | |
| SCHEMBL7775758 | 0.73 | — | — | |
| SCHEMBL29791684 | 0.73 | GAA (0.42) | — | |
| SCHEMBL12832093 | 0.72 | GAA (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9261780-B2 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9040221-B2 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | JSR CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| CN-103717592-A | Halogen-alkyl-1,3 oxazines as BACE1 and/or BACE2 inhibitors | HOFFMANN LA ROCHE | 2014-04-09 | — | — | CN | disclosed |
| CN-103502227-A | 1 as BACE1 and/or BACE2 inhibitors | HOFFMANN LA ROCHE | 2014-01-08 | — | — | CN | disclosed |
| US-20140004463-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2014-01-02 | — | — | US | disclosed |
| US-20130143160-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130122426-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| EP-1577301-B1 | Antithrombotic diaminocyclohexane derivatives | DAIICHI SANKYO CO LTD (JP) | 2012-09-12 | — | — | EP | disclosed |
| US-20100099660-A1 | METHOD FOR TREATING THROMBOSIS OR EMBOLISM AND RELATED DISEASES | DAIICHI PHARMACEUTICAL CO., LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20090281074-A1 | DRUG COMPOSITIONS AND METHODS FOR PREVENTING AND TREATING THROMBOSIS OR EMBOLISM | DAIICHI PHARMACEUTICAL CO., LTD (JP) | 2009-11-12 | — | — | US | disclosed |
| US-7576135-B2 | Diamine derivatives | DAIICHI PHARMACEUTICAL CO., LTD. (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20060252837-A1 | Cyclic diamine derivatives useful as agents for preventing and/or treating cerebral infarction, cerebral embolism, myocardial infarction, angina pectoris, pulmonary infarction, pulmonary embolism; inhibit activated blood coagulation factor X | DAIICHI PHARMACEUTICAL CO., LTD. (JP) | 2006-11-09 | — | — | US | disclosed |
| EP-1577301-A1 | DIAMINE DERIVATIVES | DAIICHI PHARMACEUTICAL CO., LTD. (JP) | 2005-09-21 | — | — | EP | disclosed |