SCHEMBL330792

SCHEMBL330792

CC(C)(S)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30336072 0.93
SCHEMBL5928 0.83
SCHEMBL538106 0.83
Water SCHEMBL4451967 0.77 TSHR (0.30)
SCHEMBL6050087 0.77
Chloromethane SCHEMBL8192571 0.77
SCHEMBL579521 0.77
Bromide SCHEMBL11622369 0.77
SCHEMBL1059851 0.77
Ethane SCHEMBL776858 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1406 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
US-20250108574-A1 LATE-STAGE CATALYSIS OF FAST ROOM-TEMPERATURE POLYMERIZATIONS ESSILOR INTERNATIONAL (FR) 2025-04-03 US claimed
EP-3581600-B1 RESIN LENS AND PREPARATION METHOD THEREFOR EFIRM NEW MAT CO LTD (CN) 2025-01-08 EP claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN claimed
EP-3107580-B1 USE OF A REVERSE-MICELLAR SYSTEM FOR DELIVERING CHELATORS OF RADIONUCLIDES AND METALS MEDESIS PHARMA (FR) 2024-02-14 EP claimed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN claimed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN claimed
CN-117285688-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-26 CN claimed
CN-116640361-B Release agent composition and application thereof 益丰新材料股份有限公司 2023-12-22 CN claimed
CN-100393765-C Method for producing transparent polythiourethane substrates and in particular optical substrates ESSILOR INT (FR) 2008-06-11 CN claimed
CN-101151250-A Processes for preparing morphinans and intermediates thereof MALLINCKRODT INC (US) 2008-03-26 CN claimed
EP-1448650-B1 METHOD FOR MAKING TRANSPARENT POLYTHIOURETHANE SUBSTRATES IN PARTICULAR OPTICAL SUBSTRATES ESSILOR INT (FR) 2006-11-08 EP claimed
US-6887401-B2 Method for making transparent polythiourethane substrates in particular optical substrates ESSILOR INTERNATIONAL COMPAGNIE GENERAL D'OPTIQUE (FR) 2005-05-03 US claimed
CN-1599763-A Method for producing transparent polythiourethane substrates and in particular optical substrates ESSILOR INT (FR) 2005-03-23 CN claimed
EP-1448650-A1 METHOD FOR MAKING TRANSPARENT POLYTHIOURETHANE SUBSTRATES IN PARTICULAR OPTICAL SUBSTRATES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2004-08-25 EP claimed
US-20030125410-A1 Method for making transparent polythiourethane substrates in particular optical substrates ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE 2003-07-03 US claimed
EP-1314746-A2 Polymerizable compositions for making thio containing resins including a salt catalyst ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2003-05-28 EP claimed
WO-2003040205-A1 METHOD FOR MAKING TRANSPARENT POLYTHIOURETHANE SUBSTRATES IN PARTICULAR OPTICAL SUBSTRATES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2003-05-15 WO claimed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed