SCHEMBL330817

SCHEMBL330817

CCNCCC(C)NCC

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
GLA P06280 1/20 0.41
CYP1A2 P05177 1/20 0.39
TSHR P16473 1/20 0.39
TP53 P04637 1/20 0.37
SIGMAR1 Q99720 1/20 0.37
KDM1A O60341 5/20 0.33
SLC6A4 P31645 2/20 0.32
SAT1 P21673 1/20 0.31
HTT P42858 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10045226 0.91 CYP2C19 (0.59) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL2031009 0.87 CYP2C19 (0.48) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL10897098 0.85 CYP2C19 (0.50) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL21572694 0.85 CYP2C19 (0.50) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL10045148 0.84 CYP2C19 (0.50) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL22054367 0.84 TSHR (0.42) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL10045227 0.82 CYP2C19 (0.46) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL8850854 0.82 CYP2C19 (0.46) CYP2C19MEN1KMT2AGLACYP1A2
SCHEMBL20442863 0.81
Hydrochloric Acid SCHEMBL8645347 0.80 CYP2C19 (0.44) CYP2C19MEN1KMT2AGLACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 275 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
US-10584823-B2 Chlorine-resistant polyethylene compound and articles made therefrom FINA TECHNOLOGY, INC. (US) 2020-03-10 US claimed
US-10067266-B2 Method of producing resin for thiourethane-based optical material using general-purpose polyisocyanate compound, resin composition for thiourethane-based optical material and thiourethane-based optical material including resin produced by the method KOC SOLUTION CO., LTD. (KR) 2018-09-04 US claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
EP-2682430-B1 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2015-10-21 EP claimed
US-20140039145-A1 METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD KOC SOLUTION CO LTD (KR) 2014-02-06 US claimed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP claimed
EP-4332140-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD OF PRODUCING OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2026-05-27 EP disclosed
EP-4741436-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED ARTICLE, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-05-13 EP disclosed
EP-4711395-A2 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-03-18 EP disclosed
EP-4101876-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED OBJECT, AND METHOD FOR PRODUCING OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2026-03-04 EP disclosed
US-12384870-B2 Method for setting polymerization condition and method for manufacturing optical material MITSUI CHEMICALS, INC. (JP) 2025-08-12 US disclosed
US-20250207285-A1 ADDITIVE FOR ACIDIC ZINC ALLOY PLATING BATH, ACIDIC ZINC ALLOY PLATING BATH AND ZINC ALLOY PLATING FILM YUKEN INDUSTRY CO., LTD. (JP) 2025-06-26 US disclosed
EP-0936233-A2 Composition for a resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-18 EP disclosed
EP-0928802-A2 Process for tinting a resin having a large refractivity index and optical material tinted by the process MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-07-14 EP disclosed
EP-0921417-A2 Epoxy/episulfide resin compositions for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-06-09 EP disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed
US-5807975-A Alkyl sulfide type episulfide compound MITSUBISHI GAS CHEMICAL COMPANY,INC. (JP) 1998-09-15 US disclosed
EP-0785194-A1 Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-07-23 EP disclosed
EP-0761665-A2 Episulfide group containing alkyl sulfide compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-03-12 EP disclosed