⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyclohexanol SCHEMBL3313473 | 0.97 | TSHR (0.67) | — | |
| Cyclohexanol SCHEMBL11239937 | 0.97 | TSHR (0.67) | — | |
| Cyclopentanol SCHEMBL3160731 | 0.90 | — | — | |
| Propane SCHEMBL10796391 | 0.89 | — | — | |
| Cycloheptanol SCHEMBL11137565 | 0.87 | TSHR (0.62) | — | |
| Alcohol SCHEMBL27908068 | 0.87 | TSHR (0.62) | — | |
| Cyclohexanol SCHEMBL21268610 | 0.87 | TSHR (0.62) | — | |
| Cyclohexanol SCHEMBL3162583 | 0.87 | TSHR (0.62) | — | |
| Cyclopentanol SCHEMBL8945182 | 0.85 | — | — | |
| SCHEMBL6429664 | 0.84 | TSHR (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240427248-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2024-12-26 | — | — | US | disclosed |
| US-20230032354-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-02-02 | — | — | US | disclosed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | disclosed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | disclosed |
| US-8497062-B2 | Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method | JSR CORPORATION (JP) | 2013-07-30 | — | — | US | disclosed |
| US-20100112475-A1 | RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |