SCHEMBL331076

SCHEMBL331076

SCC(S)CSCC(S)CS

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.42
ALDH1A1 P00352 1/20 0.42
LMNA P02545 1/20 0.42
CYP1A2 P05177 1/20 0.42
HTT P42858 1/20 0.42
HSD17B10 Q99714 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
SLC22A6 Q4U2R8 1/20 0.33
ANPEP P15144 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15360430 1.00 NR1I2 (0.42) NR1I2ALDH1A1LMNACYP1A2HTT
SCHEMBL4135462 0.87
SCHEMBL1408658 0.87 NR1I2 (0.38) NR1I2ALDH1A1LMNACYP1A2HTT
SCHEMBL1408724 0.84 NR1I2 (0.36) NR1I2ALDH1A1LMNACYP1A2HTT
SCHEMBL2467086 0.84 NR1I2 (0.36) NR1I2ALDH1A1LMNACYP1A2HTT
SCHEMBL6051709 0.82
SCHEMBL6051707 0.82
SCHEMBL14951214 0.82 NR1I2 (0.31) NR1I2ALDH1A1LMNACYP1A2HTT
SCHEMBL29744975 0.80
SCHEMBL1408224 0.80 NR1I2 (0.33) NR1I2ALDH1A1LMNACYP1A2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1264 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122094934-A Polythiol composition and use thereof 2026-05-26 CN claimed
US-12486352-B2 Composition, and optical material and lens using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-12-02 US claimed
CN-115989217-B Composition, and optical material and lens using same 三菱瓦斯化学株式会社 2025-03-28 CN claimed
US-20250101202-A1 ISOCYANATE COMPOSITION AND OPTICAL COMPOSITION Hanwha Solutions Corporation (KR) 2025-03-27 US claimed
EP-3581600-B1 RESIN LENS AND PREPARATION METHOD THEREFOR EFIRM NEW MAT CO LTD (CN) 2025-01-08 EP claimed
EP-4442725-A1 ISOCYANATE COMPOSITION AND OPTICAL COMPOSITION Hanwha Solutions Corporation (KR) 2024-10-09 EP claimed
CN-118745246-A High refractive material based on biomass magnolol and honokiol 中国科学院上海有机化学研究所 2024-10-08 CN claimed
CN-118317991-A Isocyanate composition and optical composition 韩华思路信(株) 2024-07-09 CN claimed
CN-115443296-B Diisocyanate composition and optical lens produced using the same 爱思开核心聚氨酯有限公司 2024-05-07 CN claimed
WO-2024048993-A1 ISOCYANATE COMPOSITION 한화솔루션 주식회사 2024-03-07 WO claimed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP claimed
US-20130303721-A1 METHOD FOR MANUFACTURING RESIN FOR URETHANE-BASED OPTICAL MATERIAL, RESIN COMPOSITION FOR SAME, AND OPTICAL MATERIAL MANUFACTURED THEREBY MITSUI CHEMICALS, INC. (JP) 2013-11-14 US claimed
EP-2660262-A2 METHOD FOR MANUFACTURING RESIN FOR URETHANE-BASED OPTICAL MATERIAL, RESIN COMPOSITION FOR SAME, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2013-11-06 EP claimed
EP-2455413-A1 OPTICAL MATERIAL, OPTICAL LENS, AND METHOD FOR MANUFACTURING AN OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2012-05-23 EP claimed
US-20120123081-A1 OPTICAL MATERIAL PRODUCTION PROCESS, OPTICAL MATERIAL AND OPTICAL LENS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-05-17 US claimed
EP-1316819-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2005-11-23 EP claimed
US-6872333-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) 2005-03-29 US claimed
US-20040026658-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2004-02-12 US claimed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US claimed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP claimed