SCHEMBL331342

SCHEMBL331342

CNCCCCCCCNC

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.73
SIGMAR1 Q99720 2/20 0.48
L3MBTL1 Q9Y468 1/20 0.43
PAOX Q6QHF9 1/20 0.42
PRMT3 O60678 1/20 0.39
CARM1 Q86X55 1/20 0.39
PRMT6 Q96LA8 1/20 0.39
PRMT1 Q99873 1/20 0.39
PRMT8 Q9NR22 1/20 0.39
KDM4A O75164 1/20 0.38
KDM4C Q9H3R0 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HTR1B P28222 1/20 0.36
HTR2A P28223 1/20 0.36
HRH1 P35367 1/20 0.36
MAPT P10636 1/20 0.35
KDM4E B2RXH2 1/20 0.35
MAPK1 P28482 1/20 0.35
HIF1A Q16665 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL331178 1.00
SCHEMBL5909406 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL331550 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7511253 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7519351 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL6838885 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7513715 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7519363 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7518935 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3
SCHEMBL7512652 1.00 EPHX1 (0.73) EPHX1SIGMAR1L3MBTL1PAOXPRMT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 307 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119912732-A Antistatic protective glove and preparation method thereof 山东津莱环海医疗科技有限公司 2025-05-02 CN claimed
US-10067266-B2 Method of producing resin for thiourethane-based optical material using general-purpose polyisocyanate compound, resin composition for thiourethane-based optical material and thiourethane-based optical material including resin produced by the method KOC SOLUTION CO., LTD. (KR) 2018-09-04 US claimed
EP-2682430-B1 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2015-10-21 EP claimed
US-20140039145-A1 METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD KOC SOLUTION CO LTD (KR) 2014-02-06 US claimed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP claimed
US-5061764-A MOLDABLE AND/OR EXTRUDABLE POLY(ENAMINE KETONE-CO-ALKYLENE ETHER) BLOCK COMPOLYMERS UNIVERSITY OF AKRON (US) 1991-10-29 US claimed
EP-4332140-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD OF PRODUCING OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2026-05-27 EP disclosed
EP-4741436-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED ARTICLE, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-05-13 EP disclosed
EP-4711395-A2 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-03-18 EP disclosed
EP-4101876-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED OBJECT, AND METHOD FOR PRODUCING OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2026-03-04 EP disclosed
US-12384870-B2 Method for setting polymerization condition and method for manufacturing optical material MITSUI CHEMICALS, INC. (JP) 2025-08-12 US disclosed
CN-119912732-B Antistatic protective glove and preparation method thereof 山东津莱环海医疗科技有限公司 2025-07-25 CN disclosed
US-20250207285-A1 ADDITIVE FOR ACIDIC ZINC ALLOY PLATING BATH, ACIDIC ZINC ALLOY PLATING BATH AND ZINC ALLOY PLATING FILM YUKEN INDUSTRY CO., LTD. (JP) 2025-06-26 US disclosed
EP-0761665-A2 Episulfide group containing alkyl sulfide compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-03-12 EP disclosed
US-5536425-A DURABILITY SONY CORPORATION (JP) 1996-07-16 US disclosed
US-5453539-A Durability SONY CORPORATION (JP) 1995-09-26 US disclosed
EP-0519406-A2 Novel perfluoropolyether derivatives, and lubricants and magnetic recording medium using the same SONY CORPORATION (JP) 1992-12-23 EP disclosed
US-5061764-A MOLDABLE AND/OR EXTRUDABLE POLY(ENAMINE KETONE-CO-ALKYLENE ETHER) BLOCK COMPOLYMERS UNIVERSITY OF AKRON (US) 1991-10-29 US disclosed
US-4140658-A Cyanamides of secondary amines as epoxy curing agents CIBA-GEIGY CORPORATION (US) 1979-02-20 US disclosed
US-4009208-A N,N'-HEPTAMETHYLENEBIS(4-METHOXYBENZAMIDE) STERLING DRUG INC. (US) 1977-02-22 US disclosed