SCHEMBL3317962

SCHEMBL3317962

C=CCOC(C)=C(C)[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL84277 0.76
SCHEMBL6557169 0.73 TSHR (0.40)
SCHEMBL911033 0.73
SCHEMBL5694339 0.70
SCHEMBL28467925 0.70
SCHEMBL465993 0.70 TSHR (0.40)
SCHEMBL1024005 0.70 TSHR (0.40)
SCHEMBL1162480 0.69
SCHEMBL1883675 0.69
SCHEMBL1445280 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230365733-A1 ORGANOSILICON COMPOUND GRAFT COPOLYMER AND RUBBER COMPOSITION FOR TIRE INCLUDING THE COPOLYMER MITSUI CHEMICALS, INC. (JP) 2023-11-16 US disclosed
EP-4230434-A1 ORGANOSILICON COMPOUND GRAFT COPOLYMER, AND TIRE RUBBER COMPOSITION CONTAINING SAID COPOLYMER Mitsui Chemicals, Inc. (JP) 2023-08-23 EP disclosed
CN-116018278-A Organosilicon compound graft copolymer and rubber composition for tire comprising the same 三井化学株式会社 2023-04-25 CN disclosed
WO-2022080396-A1 ORGANOSILICON COMPOUND GRAFT COPOLYMER, AND TIRE RUBBER COMPOSITION CONTAINING SAID COPOLYMER 三井化学株式会社 2022-04-21 WO disclosed
WO-2020116367-A1 POLYBUTADIENE AND METHOD FOR PRODUCING SAME 宇部興産株式会社 2020-06-11 WO disclosed
US-8460069-B2 Lens holder HOYA CORPORATION (JP) 2013-06-11 US disclosed
US-8216024-B2 Spectacle lens edging method HOYA CORPORATION (JP) 2012-07-10 US disclosed
EP-2140971-B1 LENS HOLDER HOYA CORP (JP) 2012-05-23 EP disclosed
EP-1452549-B1 PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER SEKISUI CHEMICAL CO LTD (JP) 2010-11-17 EP disclosed
US-20100112915-A1 LENS HOLDER HOYA CORPORATION (JP) 2010-05-06 US disclosed
EP-1452549-A1 PROCESS FOR PRODUCING MODIFIED POLYMER&amp;comma; APPARATUS FOR PRODUCING MODIFIED POLYMER&amp;comma; AND MODIFIED POLYMER SEKISUI CHEMICAL CO., LTD. (JP) 2004-09-01 EP disclosed
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed
EP-0183493-B2 Modified ethylenic random copolymer MITSUI PETROCHEMICAL IND (JP) 1995-05-24 EP disclosed
US-5093418-A Grafted with unsaturated acid, ester, anhydride, vinylaromatic or unsaturated silane compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1992-03-03 US disclosed
EP-0183493-B1 MODIFIED ETHYLENIC RANDOM COPOLYMER MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-09-19 EP disclosed
US-4908411-A Ethylene, alpha olefin, grafted thereto unsaturated carboxylic acid, styrene hydrocarbon, unsaturated silane compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-03-13 US disclosed
EP-0183493-A2 Modified ethylenic random copolymer MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-06-04 EP disclosed