SCHEMBL3320271

SCHEMBL3320271

FC1C(F)C(F)C1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24425415 1.00
SCHEMBL1130260 1.00
SCHEMBL18694999 1.00
SCHEMBL24425413 1.00
SCHEMBL858269 1.00
SCHEMBL23734616 0.71
SCHEMBL18236384 0.71
SCHEMBL23600295 0.71
SCHEMBL17683665 0.71
SCHEMBL24245230 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114671735-B Preparation method of tetrafluorocyclobutane 武汉船用电力推进装置研究所(中国船舶重工集团公司第七一二研究所) 2024-04-02 CN claimed
CN-114671735-A Preparation method of tetrafluorocyclobutane 武汉船用电力推进装置研究所(中国船舶重工集团公司第七一二研究所) 2022-06-28 CN claimed
US-11152223-B2 Fluorocarbon molecules for high aspect ratio oxide etch AMERICAN AIR LIQUIDE, INC. (US) 2021-10-19 US claimed
CN-107275206-B Fluorocarbon molecules for high aspect ratio oxide etch 乔治洛德方法研究和开发液化空气有限公司 2021-03-26 CN claimed
CN-105580116-B Method for etching semiconductor structure using etching gas 乔治洛德方法研究和开发液化空气有限公司 2020-02-07 CN claimed
US-20190326129-A1 FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH AIR LIQUIDE AMERICAN (US) 2019-10-24 US claimed
US-10381240-B2 Fluorocarbon molecules for high aspect ratio oxide etch AMERICAN AIR LIQUIDE, INC. (US) 2019-08-13 US claimed
CN-105646757-B A kind of preparation method of cationic polymerization system and high degree of unsaturation isoolefin copolymers 中国石油化工股份有限公司 2018-04-13 CN claimed
CN-107365244-A Organic solvent provides hydrogen source and the method that hydrogen halogen exchange reaction prepares 1H perhalogeno cycloolefins occurs 北京宇极科技发展有限公司 2017-11-21 CN claimed
US-9773679-B2 Method of etching semiconductor structures with etch gas AMERICAN AIR LIQUIDE, INC. (US) 2017-09-26 US claimed
US-20170032976-A1 FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH AIR LIQUIDE AMERICAN (US) 2017-02-02 US claimed
US-9514959-B2 Fluorocarbon molecules for high aspect ratio oxide etch AMERICAN AIR LIQUIDE, INC. (US) 2016-12-06 US claimed
US-20160307764-A1 METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS AMERICAN AIR LIQUIDE, INC. (US) 2016-10-20 US claimed
US-20150294880-A1 FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH AMERICAN AIR LIQUIDE, INC. 2015-10-15 US claimed
WO-2014070838-A1 FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2014-05-08 WO claimed
EP-1966254-A1 HALOGENATION PROCESSES ExxonMobil Chemical Patents Inc. (US) 2008-09-10 EP claimed
WO-2007075164-A1 HALOGENATION PROCESSES EXXONMOBIL CHEMICAL PATENTS INC. (US) 2007-07-05 WO claimed
US-5488142-A Fluorination in tubular reactor system MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-01-30 US claimed
EP-0455399-A2 Process for making organic fluorine compounds MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-11-06 EP claimed
US-3996301-A CRACKING TETRA-FLUORO-CYCLOBUTANE; DIMERIZATION; CODIMERIZATION PHILLIPS PETROLEUM COMPANY (US) 1976-12-07 US claimed