SCHEMBL332205

SCHEMBL332205

C=Cc1ccccc1S(=O)(=O)O.[KH]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.43
ALDH1A1 P00352 1/20 0.40
MYC P01106 1/20 0.39
TSHR P16473 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TTR P02766 2/20 0.37
HTT P42858 1/20 0.37
FABP4 P15090 1/20 0.34
CCNA2 P20248 1/20 0.34
CDK2 P24941 1/20 0.34
MAPK14 Q16539 1/20 0.34
NR4A1 P22736 1/20 0.33
CYP1A2 P05177 1/20 0.33
PGAM1 P18669 1/20 0.33
MEN1 O00255 1/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.32
BLM P54132 1/20 0.32
KMT2A Q03164 1/20 0.32
CHAT P28329 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15000 0.98 TDP1 (0.44) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL29361804 0.98 TDP1 (0.44) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL2438058 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL8535661 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
Ammonia Solution, Strong SCHEMBL142076 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL313313 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
Formaldehyde SCHEMBL10338469 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL1888655 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL1806020 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2
SCHEMBL6131308 0.96 TDP1 (0.43) TDP1ALDH1A1MYCTSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103936914-B High temperature resistance is without fluorescence nano anti-collapse and anti-falling filtration agent and preparation method thereof CNPC BOHAI DRILLING ENGINEERING CO., LTD. (CN) 2016-05-18 CN claimed
CN-103554348-B A kind of polymkeric substance, its preparation method and application GUANGDONG INDUSTRY TECHNICAL COLLEGE (CN) 2016-03-30 CN claimed
CN-104177532-A Modified vinyl alcohol-series polymer and its preparation method and use LI RUJI 2014-12-03 CN claimed
EP-2157064-B1 Composition for ceramic extrusion-molded body and method for manufacturing a ceramic extrusion-molded body SHINETSU CHEMICAL CO (JP) 2014-08-20 EP claimed
CN-103936914-A High temperature resistant non-fluorescence anti-sloughing nano-filtrate reducer and preparation method thereof CNPC BOHAI DRILLING ENG CO LTD 2014-07-23 CN claimed
CN-103554348-A Polymer and preparation method and application thereof GUANGDONG IND TECH COLLEGE 2014-02-05 CN claimed
US-8097546-B2 Composition for ceramic extrusion-molded body and method for manufacturing a ceramic extrusion-molded body SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-17 US claimed
CN-122095475-A Power unit comprising different droplets separated by amphiphilic membranes 2026-05-26 CN disclosed
WO-2025046221-A1 POWER UNIT COMPRISING DISTINCT DROPLETS SEPARATED BY AN AMPHIPHILIC MEMBRANE OXFORD UNIVERSITY INNOVATION LIMITED (GB) 2025-03-06 WO disclosed
CN-109777378-A A kind of preparation method of resistant to high temperatures, salt resistant drilling nanoemulsions copolymer fluid loss agent 河南省新乡市第七化工有限公司 2019-05-21 CN disclosed
CN-108885397-A surface treatment method and surface treatment liquid 东京应化工业株式会社 2018-11-23 CN disclosed
CN-103936914-B High temperature resistance is without fluorescence nano anti-collapse and anti-falling filtration agent and preparation method thereof CNPC BOHAI DRILLING ENGINEERING CO., LTD. (CN) 2016-05-18 CN disclosed
CN-103554348-B A kind of polymkeric substance, its preparation method and application GUANGDONG INDUSTRY TECHNICAL COLLEGE (CN) 2016-03-30 CN disclosed
EP-1477470-A1 PROCESS FOR THE PRODUCTION OF METAL SALTS OF RADICAL-POLYMERIZABLE COMPOUNDS Dow Corning Toray Silicone Company, Ltd. (JP) 2004-11-17 EP disclosed
CN-1510512-A Multi-layer photo picture substrate containing 1,4-oxane dimethonal 伊斯曼柯达公司 2004-07-07 CN disclosed
EP-0301508-B1 Method for producing a silver halide photographic emulsion FUJI PHOTO FILM CO LTD (JP) 1994-03-23 EP disclosed
US-4990435-A Stable polymeric coating MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-02-05 US disclosed
EP-0226129-B1 SILVER HALIDE PHOTOGRAPHIC ELEMENT, PHOTOGRAPHIC COATING COMPOSITION AND PROCESS TO PREPARE AN AQUEOUS DISPERSION OF A HYDROPHOBIC COMPOUND MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-05-23 EP disclosed
EP-0301508-A2 Method for producing a silver halide photographic emulsion FUJI PHOTO FILM CO., LTD. (JP) 1989-02-01 EP disclosed
EP-0226129-A2 Silver halide photographic element, photographic coating composition and process to prepare an aqueous dispersion of a hydrophobic compound MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-06-24 EP disclosed