⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1814604 | 1.00 | — | — | |
| SCHEMBL8404063 | 0.97 | — | — | |
| SCHEMBL5085652 | 0.97 | — | — | |
| SCHEMBL9705838 | 0.97 | — | — | |
| Fluoride SCHEMBL8452106 | 0.97 | — | — | |
| SCHEMBL9219476 | 0.97 | — | — | |
| SCHEMBL16174 | 0.97 | — | — | |
| Ammonia Solution, Strong SCHEMBL218243 | 0.93 | — | — | |
| SCHEMBL453456 | 0.93 | — | — | |
| SCHEMBL2915272 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1611 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250179339-A1 | HIGH TEMPERATURE STABLE CURABLE BONDING COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY | 2025-06-05 | — | — | US | claimed |
| WO-2023170501-A1 | HIGH TEMPERATURE STABLE CURABLE BONDING COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2023-09-14 | — | — | WO | claimed |
| CN-112203971-A | Hydrogen carrier compound | 氢试实验室有限公司 | 2021-01-08 | — | — | CN | claimed |
| US-9000065-B2 | Polymers for contact lenses | Ocutec Ltd. (GB) | 2015-04-07 | — | — | US | claimed |
| US-20120302661-A1 | Polymers for Contact Lenses | OCUTEC LIMITED (GB) | 2012-11-29 | — | — | US | claimed |
| US-7936068-B2 | Semiconductor device having an interconnect structure and a reinforcing insulating film | RENESAS ELECTRONICS CORPORATION (JP) | 2011-05-03 | — | — | US | claimed |
| US-20100032845-A1 | SEMICONDUCTOR DEVICE HAVING AN INTERCONNECT STRUCTURE AND A REINFORCING INSULATING FILM AND METHOD OF MANUFACTURING SUCH DEVICE | NEC ELECTRONICS CORPORATION (JP) | 2010-02-11 | — | — | US | claimed |
| US-7612453-B2 | Semiconductor device having an interconnect structure and a reinforcing insulating film | NEC ELECTRONICS CORPORATION (JP) | 2009-11-03 | — | — | US | claimed |
| US-7229921-B2 | Semiconductor device and manufacturing method for the same | NEC ELECTRONICS CORPORATION (JP) | 2007-06-12 | — | — | US | claimed |
| US-7230337-B2 | Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same | NEC ELECTRONICS CORPORATION (JP) | 2007-06-12 | — | — | US | claimed |
| US-5025073-A | Containing inclusion compound of platinum complex | GENERAL ELECTRIC COMPANY (US) | 1991-06-18 | — | — | US | claimed |
| EP-0423588-A2 | One part heat curable organopolysiloxane compositions | GENERAL ELECTRIC COMPANY (US) | 1991-04-24 | — | — | EP | claimed |
| US-4943596-A | HIGH TENSILE STRENGTH, CONTAINS POLYIMIDE-POLYSILOXANE BLOCK POLYMER | GENERAL ELECTRIC COMPANY (US) | 1990-07-24 | — | — | US | claimed |
| US-4908228-A | Dioxolane, diol and diacrylate silicon compounds and method for their preparation and use | DOW CORNING CORPORATION (US) | 1990-03-13 | — | — | US | claimed |
| EP-0341469-A2 | High strength silicone foam, and methods for making | GENERAL ELECTRIC COMPANY (US) | 1989-11-15 | — | — | EP | claimed |
| US-4810728-A | POLYIMIDESILOXANE BLOCK COPOLYMER | GENERAL ELECTRIC COMPANY (US) | 1989-03-07 | — | — | US | claimed |
| US-4766163-A | UNSATURATED POLYESTER REACTED WITH ORGANOSILICON COMPOUND | BRIDGES CORPORATION PTY LTD (AU) | 1988-08-23 | — | — | US | claimed |
| EP-0266895-A2 | Dioxolane, diol and diacrylate silicon compounds and method for their preparation and use | DOW CORNING CORPORATION (US) | 1988-05-11 | — | — | EP | claimed |
| US-4705765-A | PLATINUM COMPLEX | GENERAL ELECTRIC COMPANY (US) | 1987-11-10 | — | — | US | claimed |
| US-4681963-A | REACTION PRODUCT BETWEEN SILICON HYDRIDE OR ZILOXANE HYDRIDE AND PT(O) OR PT(II) CATALYST | GENERAL ELECTRIC COMPANY (US) | 1987-07-21 | — | — | US | claimed |