⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9903827 | 0.74 | — | — | |
| SCHEMBL3322234 | 0.67 | — | — | |
| SCHEMBL2154313 | 0.67 | MEN1 (0.31) | — | |
| SCHEMBL297575 | 0.64 | — | — | |
| SCHEMBL6767739 | 0.61 | — | — | |
| SCHEMBL3328184 | 0.61 | TDP1 (0.30) | — | |
| SCHEMBL3325928 | 0.61 | — | — | |
| SCHEMBL12744808 | 0.57 | — | — | |
| SCHEMBL28871004 | 0.57 | — | — | |
| SCHEMBL2059977 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8460753-B2 | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-06-11 | — | — | US | claimed |
| US-20140065844-A1 | Amino Vinylsilane Precursors for Stressed SiN Films | VERSUM MATERIALS US, LLC | 2014-03-06 | — | — | US | disclosed |
| US-8460753-B2 | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-06-11 | — | — | US | disclosed |
| EP-2465861-A1 | Amino vinylsilane precursors for compressively stressed SiN films | Air Products and Chemicals, Inc. (US) | 2012-06-20 | — | — | EP | disclosed |
| US-20120148745-A1 | Aminovinylsilane for CVD and ALD SiO2 Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-06-14 | — | — | US | disclosed |
| EP-2192207-A1 | Amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-02 | — | — | EP | disclosed |
| US-20100120262-A1 | Amino Vinylsilane Precursors for Stressed SiN Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-05-13 | — | — | US | disclosed |