⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL333054 | 1.00 | — | — | |
| SCHEMBL2327904 | 1.00 | — | — | |
| SCHEMBL6237587 | 0.82 | — | — | |
| SCHEMBL6237585 | 0.82 | — | — | |
| SCHEMBL333006 | 0.80 | — | — | |
| SCHEMBL333007 | 0.80 | — | — | |
| SCHEMBL6236616 | 0.79 | — | — | |
| SCHEMBL6236618 | 0.79 | — | — | |
| SCHEMBL21160289 | 0.75 | — | — | |
| SCHEMBL332707 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 387 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630687-B2 | Compositions comprising Z-1,1,1,4,4,4-hexafluoro-2-butene and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2026-05-19 | — | — | US | claimed |
| US-20240199833-A1 | COMPOSITIONS COMPRISING Z-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2024-06-20 | — | — | US | claimed |
| US-11978600-B2 | Dielectric-insulation or arc-extinction fluid | HITACHI ENERGY LTD (CH) | 2024-05-07 | — | — | US | claimed |
| US-11851602-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2023-12-26 | — | — | US | claimed |
| EP-3987553-B1 | DIELECTRIC-INSULATION OR ARC-EXTINCTION FLUID | HITACHI ENERGY SWITZERLAND AG (CH) | 2023-11-01 | — | — | EP | claimed |
| US-20220367134-A1 | DIELECTRIC-INSULATION OR ARC-EXTINCTION FLUID | HITACHI ENERGY LTD (CH) | 2022-11-17 | — | — | US | claimed |
| EP-3461872-B1 | REFRIGERANT ADDITIVE COMPOSITIONS CONTAINING PERFLUOROPOLYETHERS | CHEMOURS CO FC LLC (US) | 2022-11-09 | — | — | EP | claimed |
| CN-115135995-A | Penetrating fluid, cleaning agent and developer for penetration flaw detection test method | 中央硝子株式会社 | 2022-09-30 | — | — | CN | claimed |
| EP-3253844-B1 | COMPOSITIONS COMPRISING Z-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND USES THEREOF | CHEMOURS CO FC LLC (US) | 2022-06-22 | — | — | EP | claimed |
| EP-3987553-A1 | DIELECTRIC-INSULATION OR ARC-EXTINCTION FLUID | Hitachi Energy Switzerland AG (CH) | 2022-04-27 | — | — | EP | claimed |
| WO-2007143051-A2 | VAPOR COMPRESSION UTILIZING IONIC LIQUID AS COMPRESSOR LUBRICANT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-13 | — | — | WO | claimed |
| US-20070284555-A1 | Refrigerant additive compositionis containing perfluoropolyethers | THE CHEMOURS COMPANY FC, LLC | 2007-12-13 | — | — | US | claimed |
| WO-2007126760-A2 | COMPOSITIONS COMPRISING IODOTRIFLUOROMETHANE AND STABILIZERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-11-08 | — | — | WO | claimed |
| WO-2007123786-A1 | SELECTIVELY REACTING OLEFINS HAVING A TERMINAL CF2 GROUP IN A MIXTURE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-11-01 | — | — | WO | claimed |
| US-20070187639-A1 | Refrigerant additive compositions containing perfluoropolethers | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-08-16 | — | — | US | claimed |
| WO-2007082046-A1 | REFRIGERANT ADDITIVE COMPOSITIONS CONTAINING PERFLUOROPOLYETHERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-07-19 | — | — | WO | claimed |
| US-20070108403-A1 | refrigerants as heat exchanger; comprising 1,1,1,4,4,5,5,5-octafluoro-2-pentene mixture | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-05-17 | — | — | US | claimed |
| US-20050247670-A1 | Method of dry etching, dry etching gas and process for producing perfluoro-2-pentyne | ZEON CORPORATION (JP) | 2005-11-10 | — | — | US | claimed |
| CN-1669129-A | Dry etching method, dry etching gas, and method for producing perfluoro-2-pentyne | ZEON CORP (JP) | 2005-09-14 | — | — | CN | claimed |
| EP-1542268-A1 | METHOD OF DRY ETCHING, DRY ETCHING GAS AND PROCESS FOR PRODUCING PERFLUORO-2-PENTYNE | Zeon Corporation (JP) | 2005-06-15 | — | — | EP | claimed |