Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.32 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | DNM1 | Q05193 | 4/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5412372 | 0.92 | TSHR (0.36) | TSHRALDH1A1 | |
| SCHEMBL5401229 | 0.84 | TSHR (0.31) | TSHR | |
| SCHEMBL11729323 | 0.82 | — | — | |
| SCHEMBL3339180 | 0.82 | TSHR (0.41) | TSHRALDH1A1FAAHZDHHC20ZDHHC2 | |
| SCHEMBL2122621 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 | |
| SCHEMBL2122966 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 | |
| SCHEMBL2122736 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 | |
| SCHEMBL15847402 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 | |
| SCHEMBL2119690 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 | |
| SCHEMBL2123739 | 0.81 | TSHR (0.42) | TSHRALDH1A1THRBDNM1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| CN-101133364-B | Composition for resist underlayer film and method for producing same | JSR CORP | 2013-03-20 | — | — | CN | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101133364-A | Composition for resist underlayer film and method for producing same | JSR CORP (JP) | 2008-02-27 | — | — | CN | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |