Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.33 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6037421 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL6037318 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL4380232 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL8510977 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL6037315 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL387079 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL8512174 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL8511146 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL8515574 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT | |
| SCHEMBL26922374 | 1.00 | TSHR (0.48) | TSHRALDH1A1LMNALPAR3MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025023143-A1 | GLASS CLOTH TREATMENT LIQUID AND SURFACE TREATED GLASS CLOTH | 信越化学工業株式会社 | 2025-01-30 | — | — | WO | disclosed |
| CN-110461982-B | Adhesive composition and structure | 昭和电工材料株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-111995975-B | Adhesive composition and structure | 日立化成株式会社 | 2022-12-02 | — | — | CN | disclosed |
| CN-108350320-B | Adhesive composition and structure | 昭和电工材料株式会社 | 2021-11-26 | — | — | CN | disclosed |
| CN-111995975-A | Adhesive composition and structure | 日立化成株式会社 | 2020-11-27 | — | — | CN | disclosed |
| CN-108350341-B | Adhesive composition and structure | 日立化成株式会社 | 2020-09-04 | — | — | CN | disclosed |
| US-9303180-B2 | Low-temperature cureable coating composition and article having cured coating thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-05 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20140336329-A1 | LOW-TEMPERATURE CUREABLE COATING COMPOSITION AND ARTICLE HAVING CURED COATING THEREOF | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| EP-2801596-A1 | Low-temperature curable coating composition and article having cured coating thereof | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-11-12 | — | — | EP | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20120136082-A1 | BINDING AGENTS BASED ON HIGHLY BRANCHED POLYOLEFINS COMPRISING SILANE GROUPS | WACKER CHEMIE AG (DE) | 2012-05-31 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |