Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | CA9 | Q16790 | 3/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.33 |
| ▸ | CA6 | P23280 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | HSD17B1 | P14061 | 2/20 | 0.31 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.31 |
| ▸ | MGAM | O43451 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SI | P14410 | 1/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35817 | 0.85 | — | — | |
| SCHEMBL28876706 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL3882937 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL277599 | 0.83 | — | — | |
| SCHEMBL7522856 | 0.79 | — | — | |
| SCHEMBL9351404 | 0.78 | KDM4E (0.32) | CA12CA2CA9CYP3A4CA14 | |
| SCHEMBL1082507 | 0.77 | — | — | |
| SCHEMBL28445987 | 0.70 | — | — | |
| Phenol SCHEMBL1440050 | 0.69 | CA12 (0.42) | CA12CA2CA9CYP3A4CA14 | |
| SCHEMBL28462254 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6455416-B1 | Developer soluble dyed BARC for dual damascene process | ADVANCED MICRO DEVICES, INC. | 2002-09-24 | — | — | US | claimed |
| US-9595670-B1 | Resistive random access memory (RRAM) cell and method for forming the RRAM cell | Crossbar, Inc. (US) | 2017-03-14 | — | — | US | disclosed |
| US-8445372-B2 | Selective silicide formation using resist etch back | SPANSION LLC (US) | 2013-05-21 | — | — | US | disclosed |
| US-20100099249-A1 | SELECTIVE SILICIDE FORMATION USING RESIST ETCH BACK | SPANSION LLC (US) | 2010-04-22 | — | — | US | disclosed |
| US-7691751-B2 | Selective silicide formation using resist etchback | SPANSION LLC (US) | 2010-04-06 | — | — | US | disclosed |
| US-20090111265-A1 | SELECTIVE SILICIDE FORMATION USING RESIST ETCHBACK | SPANSION LLC (US) | 2009-04-30 | — | — | US | disclosed |
| WO-2009055384-A1 | SELECTIVE SILICIDE FORMATION USING RESIST ETCH BACK | SPANSION LLC (US) | 2009-04-30 | — | — | WO | disclosed |
| US-7056646-B1 | Use of base developers as immersion lithography fluid | ADVANCED MICRO DEVICES, INC. (US) | 2006-06-06 | — | — | US | disclosed |
| US-6861209-B2 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-03-01 | — | — | US | disclosed |
| US-20040106070-A1 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-03 | — | — | US | disclosed |
| US-6534243-B1 | A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature | ADVANCED MICRO DEVICES, INC. | 2003-03-18 | — | — | US | disclosed |
| US-6492075-B1 | COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST | ADVANCED MICRO DEVICES, INC. | 2002-12-10 | — | — | US | disclosed |
| US-6455416-B1 | Developer soluble dyed BARC for dual damascene process | ADVANCED MICRO DEVICES, INC. | 2002-09-24 | — | — | US | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |