SCHEMBL3341014

SCHEMBL3341014

CCO[SiH](CCCC1CC=CCC1)OCC

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.31
KDM4E B2RXH2 2/20 0.31
ALDH1A1 P00352 2/20 0.31
PKM P14618 1/20 0.31
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL297460 0.90 KDM4E (0.32) MAPK1KDM4EALDH1A1PKMTDP1
SCHEMBL3344928 0.83 MAPK1 (0.33) MAPK1
SCHEMBL6891696 0.78 MAPK1 (0.33) MAPK1
SCHEMBL4635924 0.78 MAPK1 (0.33) MAPK1
SCHEMBL296493 0.77 KDM4E (0.31) KDM4EALDH1A1PKMTDP1
SCHEMBL6057261 0.75 CYP1A2 (0.48) MAPK1
SCHEMBL1524848 0.75 CYP1A2 (0.46) MAPK1KDM4EALDH1A1PKMTDP1
SCHEMBL2136195 0.74 MAPK1 (0.38) MAPK1KDM4EALDH1A1PKMTDP1
SCHEMBL2141114 0.74 MAPK1 (0.38) MAPK1KDM4EALDH1A1PKMTDP1
SCHEMBL2101521 0.74 MAPK1 (0.32) MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109912735-B External electron donor for olefin polymerization catalyst, catalyst system and preparation method of polyolefin 中国科学院化学研究所 2020-09-29 CN claimed
CN-109912735-B External electron donor for olefin polymerization catalyst, catalyst system and preparation method of polyolefin 中国科学院化学研究所 2020-09-29 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed