SCHEMBL3341522

SCHEMBL3341522

CCO[Si](CCCN(C)C(=O)O)(OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.31
ACHE P22303 1/20 0.31
EPHX2 P34913 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3839526 0.95 BCHE (0.33) BCHEACHEEPHX2
SCHEMBL5916532 0.93 BCHE (0.35) BCHEACHEEPHX2
SCHEMBL5916615 0.93 BCHE (0.35) BCHEACHEEPHX2
SCHEMBL4396822 0.91
SCHEMBL5916826 0.89
SCHEMBL5916548 0.89
SCHEMBL5916774 0.86
SCHEMBL3212658 0.85 CHRM1 (0.31)
SCHEMBL3207871 0.85 EPHX2 (0.30) EPHX2
SCHEMBL5916705 0.84 BCHE (0.31) BCHEACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1937697-B1 METHOD FOR PRODUCTION OF ISOCYANATOSILANES MOMENTIVE PERFORMANCE MAT INC (US) 2013-10-16 EP claimed
US-20130079449-A1 Polymer Composition and Method SOLVAY SA (BE) 2013-03-28 US claimed
WO-2013043321-A1 POLYMER COMPOSITION AND METHOD CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2013-03-28 WO claimed
EP-1869058-B1 PROCESS FOR MAKING SILYLISOCYANURATE MOMENTIVE PERFORMANCE MAT INC (US) 2009-12-16 EP claimed
EP-1885731-B1 PROCESS FOR THE PRODUCTION OF ISOCYANATOSILANE AND SILYLISOCYANURATE MOMENTIVE PERFORMANCE MAT INC (US) 2009-11-11 EP claimed
CN-114479077-A Polyamide acid ester and application thereof in liquid crystal aligning agent, liquid crystal alignment film and liquid crystal unit 波米科技有限公司 2022-05-13 CN disclosed
CN-108604029-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element using same 日产化学工业株式会社 2021-11-26 CN disclosed
CN-108027537-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2021-06-08 CN disclosed
CN-108139633-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学工业株式会社 2021-04-23 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
WO-2013043321-A1 POLYMER COMPOSITION AND METHOD CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2013-03-28 WO disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed
US-20060247407-A1 Polymers with urea groups and silyl groups and production and use thereof HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) 2006-11-02 US disclosed
US-7057001-B2 Polymers with urea groups and silyl groups and production and use thereof HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 2006-06-06 US disclosed
US-20050260401-A1 Polymers with urea groups and silyl groups and production and use thereof HENKEL AG & CO. KGAA (DE) 2005-11-24 US disclosed
EP-1328586-A1 POLYMERS WITH UREA GROUPS AND SILYL GROUPS AND PRODUCTION AND USE THEREOF Henkel Kommanditgesellschaft auf Aktien (DE) 2003-07-23 EP disclosed
WO-2002050020-A1 METHOD FOR PRODUCING ISOCYANATES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2002-06-27 WO disclosed
WO-2002034838-A1 POLYMERS WITH UREA GROUPS AND SILYL GROUPS AND PRODUCTION AND USE THEREOF HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2002-05-02 WO disclosed