Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL30612391 | 0.98 | CYP3A4 (0.32) | CYP3A4TSHR | |
| SCHEMBL1721868 | 0.77 | — | — | |
| SCHEMBL15863890 | 0.75 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL27467454 | 0.75 | NOTUM (0.34) | — | |
| SCHEMBL1101943 | 0.75 | — | — | |
| Methane SCHEMBL22772351 | 0.73 | — | — | |
| SCHEMBL8727491 | 0.73 | — | — | |
| SCHEMBL3293566 | 0.72 | TSHR (0.42) | CYP3A4TSHR | |
| SCHEMBL30730979 | 0.71 | — | — | |
| SCHEMBL14696065 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| US-11421049-B2 | Photopolymerization synergist | Piedmont Chemical Industries, LLC (US) | 2022-08-23 | — | — | US | claimed |
| WO-2022065713-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | 영창케미칼 주식회사 | 2022-03-31 | — | — | WO | claimed |
| CN-113741147-A | Photoresist with high resolution and excellent adhesion | 深圳惠美亚科技有限公司 | 2021-12-03 | — | — | CN | claimed |
| WO-2021096751-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries, LLC (US) | 2021-05-20 | — | — | WO | claimed |
| US-20210139616-A1 | Photopolymerization Synergist | Piedmont Chemical Industries, LLC | 2021-05-13 | — | — | US | claimed |
| CN-106933036-B | Preparation method of heat-sensitive positive photosensitive composition | 安徽强邦印刷材料有限公司 | 2020-06-26 | — | — | CN | claimed |
| CN-106909025-B | Photosensitive composition for heat-sensitive positive image CTP plate | 安徽强邦印刷材料有限公司 | 2020-06-26 | — | — | CN | claimed |
| CN-106933037-B | Preparation method of thermosensitive positive image CTP plate photosensitive composition | 安徽强邦印刷材料有限公司 | 2020-06-26 | — | — | CN | claimed |
| US-10345701-B2 | Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-07-09 | — | — | US | claimed |
| US-5876882-A | FORMING PHOTOSENSITIVE FILM ON TRANSPARENT SUBSTRATE; MASKING; EXPOSURE TO LIGHT | NIPPON OIL CO., LTD. (JP) | 1999-03-02 | — | — | US | claimed |
| EP-0652483-B1 | Lithographic printing plates | MINNESOTA MINING & MFG (US) | 1998-05-13 | — | — | EP | claimed |
| US-5691100-A | SEMICONDUCTORS | HOECHST JAPAN LIMITED (JP) | 1997-11-25 | — | — | US | claimed |
| EP-0652483-A1 | Lithographic printing plates | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-05-10 | — | — | EP | claimed |
| EP-0633502-A1 | PATTERN FORMING MATERIAL | HOECHST JAPAN LIMITED (JP) | 1995-01-11 | — | — | EP | claimed |
| US-5372902-A | Method for producing color filter | NIPPON OIL CO., LTD. (JP) | 1994-12-13 | — | — | US | claimed |
| WO-1992022856-A1 | PHOTOELECTROGRAPHIC IMAGING WITH A MULTI-ACTIVE ELEMENT CONTAINING NEAR-INFRARED SENSITIZING PIGMENTS | EASTMAN KODAK COMPANY (US) | 1992-12-23 | — | — | WO | claimed |
| US-4994703-A | Piezoelectric element of laminate type | MITSUBISHI KASEI CORPORATION (JP) | 1991-02-19 | — | — | US | claimed |
| CN-1042925-A | The abrasive product that contains the tackiness agent of aminoplast(ic) resin | MINNESOTA MINING & MFG (US) | 1990-06-13 | — | — | CN | claimed |
| US-4845011-A | BASIFIED ACRIDINE COMPOUND, A TRIAZINE OR QUINAZOLINONE COMPOUND | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | claimed |