SCHEMBL3347453

SCHEMBL3347453

O=C=[Co].[Ni]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL604419 0.93
Phosphine SCHEMBL27795177 0.86
SCHEMBL28292219 0.86
SCHEMBL28029186 0.80
SCHEMBL28034140 0.80
SCHEMBL27585199 0.80
SCHEMBL5984899 0.80
SCHEMBL27585197 0.76
Methyl Alcohol SCHEMBL27320791 0.76
SCHEMBL27835392 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7708912-B2 carbonyl iron powder mixture; high electromagnetic permeability powder to reduce arcing and presents a high resistance at a low applied voltage and a low resistance at a high applied voltage POLYTRONICS TECHNOLOGY CORPORATION (TW) 2010-05-04 US claimed
US-20090309074-A1 VARIABLE IMPEDANCE COMPOSITION POLYTRONICS TECHNOLOGY CORPORATION (TW) 2009-12-17 US claimed
US-7708912-B2 carbonyl iron powder mixture; high electromagnetic permeability powder to reduce arcing and presents a high resistance at a low applied voltage and a low resistance at a high applied voltage POLYTRONICS TECHNOLOGY CORPORATION (TW) 2010-05-04 US disclosed
US-20090309074-A1 VARIABLE IMPEDANCE COMPOSITION POLYTRONICS TECHNOLOGY CORPORATION (TW) 2009-12-17 US disclosed