SCHEMBL334765

SCHEMBL334765

C[S+](C)C.F[B-](F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL5804711 0.94
Dimethyl Sulfoxide SCHEMBL28151046 0.78
Ethane SCHEMBL18837989 0.72
Ethane SCHEMBL5590416 0.72
Fluoromethane SCHEMBL28011400 0.72
SCHEMBL7107352 0.71
Butane SCHEMBL31240952 0.71 TSHR (0.33)
SCHEMBL63026 0.71
SCHEMBL16047646 0.71
SCHEMBL63222 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111018700-B Oxocyclo [8] arene derivatives and preparation method thereof 清华大学 2023-03-31 CN claimed
WO-2021103795-A1 OXIDIZED RING BELT [8] AROMATIC HYDROCARBON DERIVATIVE AND PREPARATION METHOD THEREFOR 清华大学 2021-06-03 WO claimed
CN-111018700-A Oxocyclo [8] arene derivatives and preparation method thereof 清华大学 2020-04-17 CN claimed
US-8173584-B2 Composition and method for treating semiconductor substrate surface LASERWORT LTD (HK) 2012-05-08 US claimed
US-20120083436-A1 COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE LASERWORT LTD (HK) 2012-04-05 US claimed
US-8101561-B2 Composition and method for treating semiconductor substrate surface LASERWORT LTD (HK) 2012-01-24 US claimed
US-20110118165-A1 COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE Lee, Wai Mun (US) 2011-05-19 US claimed
JP-58087170-A None JP disclosed
EP-4737444-A1 PROCESSES AND INTERMEDIATES FOR PREPARING MCL1 INHIBITORS Gilead Sciences, Inc. (US) 2026-05-06 EP disclosed
US-12410146-B2 Processes and intermediates for preparing MCL1 inhibitors GILEAD SCIENCES, INC. (US) 2025-09-09 US disclosed
CN-114787139-B Methods and intermediates for preparing MCL1 inhibitors 吉利德科学公司 2025-03-11 CN disclosed
EP-4484435-A2 PROCESSES AND INTERMEDIATES FOR PREPARING MCL1 INHIBITORS Gilead Sciences, Inc. (US) 2025-01-01 EP disclosed
EP-4065567-B1 PROCESSES AND INTERMEDIATES FOR PREPARING MCL1 INHIBITORS GILEAD SCIENCES INC (US) 2024-09-11 EP disclosed
US-20020061858-A1 4\"-substituted-9-deoxo-9A-AZA-9A-homoerythromycin a derivatives PFIZER INC. 2002-05-23 US disclosed
EP-0988309-A1 C-4''-SUBSTITUTED MACROLIDE DERIVATIVES Pfizer Products Inc. (US) 2000-03-29 EP disclosed
EP-0988310-A1 4\"-SUBSTITUTED-9-DEOXO-9A-AZA-9A-HOMOERYTHROMYCIN A DERIVATIVES Pfizer Products Inc. (US) 2000-03-29 EP disclosed
WO-1998056801-A1 C-4''-SUBSTITUTED MACROLIDE DERIVATIVES PFIZER PRODUCTS INC. (US) 1998-12-17 WO disclosed
WO-1998056802-A1 4'-SUBSTITUTED-9-DEOXO-9A-AZA-9A-HOMOERYTHROMYCIN A DERIVATIVES PFIZER PRODUCTS INC. (US) 1998-12-17 WO disclosed
US-5254664-A Containing a 2-oxazoline group; molding materials NIPPON SHOKUBAI CO., LTD. (JP) 1993-10-19 US disclosed
JP-S5887170-A ADHESIVE COMPOSITION TOAGOSEI CHEM IND CO LTD 1983-05-24 JP disclosed