⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL335698 | 1.00 | — | — | |
| SCHEMBL29068702 | 0.77 | — | — | |
| SCHEMBL1531351 | 0.76 | — | — | |
| SCHEMBL6059669 | 0.76 | — | — | |
| SCHEMBL1531353 | 0.76 | — | — | |
| SCHEMBL2144332 | 0.74 | — | — | |
| SCHEMBL7110684 | 0.71 | — | — | |
| SCHEMBL3796964 | 0.67 | KMT2A (0.36) | — | |
| SCHEMBL21523012 | 0.63 | — | — | |
| SCHEMBL21523013 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| US-10626305-B2 | OLED-compatible adhesive masses having silane water scavengers | TESA SE (DE) | 2020-04-21 | — | — | US | disclosed |
| US-20190284448-A1 | Oled-Compatible Adhesives Comprising Cyclic Azasilane Water Scavengers | TESA SE (DE) | 2019-09-19 | — | — | US | disclosed |
| US-20170247582-A1 | OLED-COMPATIBLE ADHESIVE MASSES HAVING SILANE WATER SCAVENGERS | TESA SE (DE) | 2017-08-31 | — | — | US | disclosed |
| US-8097932-B2 | Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-01-17 | — | — | US | disclosed |
| US-20090146265-A1 | ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-11 | — | — | US | disclosed |
| US-7491658-B2 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-02-17 | — | — | US | disclosed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | disclosed |