SCHEMBL335920

SCHEMBL335920

C=CC[Si](C)(CC=C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2159736 0.97
SCHEMBL7615407 0.88
SCHEMBL13621315 0.83
SCHEMBL7544852 0.78
SCHEMBL13621316 0.78
SCHEMBL25175275 0.78
SCHEMBL991723 0.78
SCHEMBL1493756 0.76
SCHEMBL15302851 0.74
SCHEMBL1241842 0.74 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122079347-A High-temperature-resistant acid-alkali-corrosion-resistant flat biological filler and preparation process thereof 2026-05-26 CN claimed
CN-120059553-A Environment-friendly powder coating and preparation method and application thereof 湖南至诚新材料科技有限公司 2025-05-30 CN claimed
CN-115926097-B Polyurethane adhesive for copper-clad plate and preparation method thereof 建滔(广州)电子材料制造有限公司 2025-03-25 CN claimed
CN-119080814-A Preparation method and application of bis (trialkylsilyl) disulfonate 珠海市赛纬电子材料股份有限公司 2024-12-06 CN claimed
CN-115926097-A Polyurethane adhesive for copper-clad plate and preparation method thereof 建滔(广州)电子材料制造有限公司 2023-04-07 CN claimed
CN-112625243-B Fluorine-containing modified polysiloxane, and preparation method and application thereof 山东东岳高分子材料有限公司 2022-09-02 CN claimed
CN-112552516-B Modified polysiloxane containing fluorine ring bodies, preparation method and application thereof 山东东岳高分子材料有限公司 2022-07-01 CN claimed
CN-112920351-B Hybrid sewage treatment flocculant and preparation method thereof 山东格瑞水务有限公司 2021-12-07 CN claimed
CN-113499800-A Karstedt catalyst and preparation method thereof 江苏斯迪克新材料科技股份有限公司 2021-10-15 CN claimed
CN-112920351-A Hybrid sewage treatment flocculant and preparation method thereof 成都高云智新材料科技有限公司 2021-06-08 CN claimed
WO-2007130014-A1 ORGANOSILICON POLYMERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-11-15 WO claimed
EP-1833880-A1 ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS Matsushita Electric Works, Ltd. (JP) 2007-09-19 EP claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
WO-2006062219-A1 ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS MATSUSHITA ELECTRIC WORKS, LTD. (JP) 2006-06-15 WO claimed
CN-1782125-A Method for forming dielectric film and dielectric film IBM (US) 2006-06-07 CN claimed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US claimed
WO-2002016267-A1 FORMATION OF HYDROPHILIC SITES IN PARTIALLY SILYLATED MICELLE TEMPLATED SILICA UNIVERSITE LAVAL (CA) 2002-02-28 WO claimed