⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29053969 | 0.72 | — | — | |
| SCHEMBL6514810 | 0.72 | — | — | |
| SCHEMBL28205888 | 0.68 | — | — | |
| SCHEMBL2315761 | 0.67 | — | — | |
| SCHEMBL28815562 | 0.66 | — | — | |
| SCHEMBL27916110 | 0.66 | — | — | |
| SCHEMBL27613645 | 0.66 | — | — | |
| SCHEMBL27834062 | 0.66 | — | — | |
| SCHEMBL21271525 | 0.64 | — | — | |
| SCHEMBL28966474 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7642200-B2 | Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-05 | — | — | US | disclosed |
| US-20060166512-A1 | Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-07-27 | — | — | US | disclosed |