⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28478343 | 0.84 | — | — | |
| SCHEMBL435550 | 0.77 | MAPK1 (0.38) | — | |
| SCHEMBL29277783 | 0.76 | — | — | |
| SCHEMBL22654119 | 0.75 | — | — | |
| SCHEMBL8996103 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL27968515 | 0.74 | MAPK1 (0.36) | — | |
| SCHEMBL13458953 | 0.74 | — | — | |
| SCHEMBL29277795 | 0.74 | — | — | |
| SCHEMBL3481997 | 0.74 | — | — | |
| SCHEMBL839597 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116041963-A | Waterproof wave-absorbing silica gel film with high tearing strength and low hardness and preparation method thereof | 成都佳驰电子科技股份有限公司 | 2023-05-02 | — | — | CN | claimed |
| CN-113754802-B | Catalyst system for olefin polymerization reaction and prepolymerization catalyst composition | 中国石油化工股份有限公司 | 2023-03-31 | — | — | CN | claimed |
| CN-110938157-B | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-114984905-A | Gas adsorbent and preparation method and application thereof | 中国石油化工股份有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-112961350-B | High-temperature-resistant resin, preparation method and application thereof, high-temperature-resistant coating containing high-temperature-resistant resin, preparation method and coating | 北京生泰宝科技有限公司 | 2022-04-15 | — | — | CN | claimed |
| CN-113754802-A | Catalyst system for olefin polymerization reaction and prepolymerization catalyst composition | 中国石油化工股份有限公司 | 2021-12-07 | — | — | CN | claimed |
| CN-111234062-B | Catalyst system for olefin polymerization and use thereof | 中国石油化工股份有限公司 | 2021-08-03 | — | — | CN | claimed |
| CN-111234062-A | Catalyst system for olefin polymerization and use thereof | 中国石油化工股份有限公司 | 2020-06-05 | — | — | CN | claimed |
| CN-110938157-A | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2020-03-31 | — | — | CN | claimed |
| CN-110938162-A | Catalyst system for olefin polymerization and prepolymerized catalyst composition and use thereof | 中国石油化工股份有限公司 | 2020-03-31 | — | — | CN | claimed |
| US-7491658-B2 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-02-17 | — | — | US | claimed |
| US-20080265381-A1 | SiCOH DIELECTRIC | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-10-30 | — | — | US | claimed |
| US-20070173071-A1 | SiCOH dielectric | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-07-26 | — | — | US | claimed |
| US-20060165891-A1 | SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-07-27 | — | — | US | claimed |
| US-20060079099-A1 | Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-13 | — | — | US | claimed |
| US-20050194619-A1 | SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-09-08 | — | — | US | claimed |
| US-6890599-B2 | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays | INTELLECTUAL BUSINESS MACHINES CORPORATION (US) | 2005-05-10 | — | — | US | claimed |
| US-20030211341-A1 | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays | AU OPTRONICS CORPORATION (TW) | 2003-11-13 | — | — | US | claimed |
| US-6632536-B2 | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-10-14 | — | — | US | claimed |
| US-20020084252-A1 | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays | AU OPTRONICS CORPORATION (TW) | 2002-07-04 | — | — | US | claimed |