⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3368707 | 1.00 | — | — | |
| SCHEMBL3622511 | 1.00 | — | — | |
| SCHEMBL3369486 | 1.00 | — | — | |
| SCHEMBL25221226 | 1.00 | — | — | |
| SCHEMBL3367745 | 1.00 | — | — | |
| SCHEMBL25222892 | 1.00 | — | — | |
| SCHEMBL25221795 | 1.00 | — | — | |
| SCHEMBL25255577 | 1.00 | — | — | |
| SCHEMBL3369493 | 1.00 | — | — | |
| SCHEMBL3371319 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-8669375-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8318964-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7833691-B2 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| CN-1854133-B | Heterocycle-bearing onium salts | WAKO PURE CHEM IND LTD | 2010-11-10 | — | — | CN | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-1690685-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| CN-100475803-C | Heterocyclic onium salt | WAKO PURE CHEM IND LTD (JP) | 2009-04-08 | — | — | CN | disclosed |
| US-7318991-B2 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| CN-1854133-A | Heterocycle-bearing onium salts | WAKO PURE CHEM IND LTD (JP) | 2006-11-01 | — | — | CN | disclosed |
| US-7101918-B2 | Hybrid type onium salt | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-05 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| CN-1622943-A | Heterocyclic onium salt | WAKO PURE CHEM IND LTD (JP) | 2005-06-01 | — | — | CN | disclosed |
| CN-1578766-A | Hybrid onium salt | WAKO PURE CHEM IND LTD (JP) | 2005-02-09 | — | — | CN | disclosed |
| US-20050020710-A1 | Hybrid onium salt | WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |