⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27688359 | 0.95 | — | — | |
| SCHEMBL28765948 | 0.95 | — | — | |
| SCHEMBL27688235 | 0.95 | — | — | |
| SCHEMBL28972054 | 0.88 | — | — | |
| SCHEMBL29043245 | 0.84 | — | — | |
| Toluene SCHEMBL451397 | 0.82 | — | — | |
| Toluene SCHEMBL6474268 | 0.76 | — | — | |
| SCHEMBL1052145 | 0.67 | — | — | |
| SCHEMBL1052146 | 0.67 | — | — | |
| SCHEMBL2480637 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117903216-A | Phosphine-phenol single metallocene complex and preparation method and application thereof | 中国石油化工股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| WO-2024078525-A1 | PHOSPHINE-PHENOL HALF-METALLOCENE COMPLEX, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 中国石油化工股份有限公司 | 2024-04-18 | — | — | WO | claimed |
| CN-117903216-A | Phosphine-phenol single metallocene complex and preparation method and application thereof | 中国石油化工股份有限公司 | 2024-04-19 | — | — | CN | disclosed |
| WO-2024078525-A1 | PHOSPHINE-PHENOL HALF-METALLOCENE COMPLEX, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 中国石油化工股份有限公司 | 2024-04-18 | — | — | WO | disclosed |
| CN-112470257-B | Method for forming a crystallographically stable ferroelectric hafnium zirconium-based film for semiconductor devices | 东京毅力科创株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-111344316-B | Polyethylene compositions and articles made therefrom | 埃克森美孚化学专利公司 | 2023-02-03 | — | — | CN | disclosed |
| WO-2023008058-A1 | FLOW BATTERY SYSTEM EMPLOYING REDOX CONTROL OF CO2 | 国立研究開発法人産業技術総合研究所 | 2023-02-02 | — | — | WO | disclosed |
| CN-114944320-A | Reactor to form a film on sidewalls of a memory cell | 美光科技公司 | 2022-08-26 | — | — | CN | disclosed |
| CN-110431253-B | Raw material for chemical vapor deposition comprising iridium complex and chemical vapor deposition method using the same | 田中贵金属工业株式会社 | 2022-02-25 | — | — | CN | disclosed |
| US-11084837-B2 | Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw material | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2021-08-10 | — | — | US | disclosed |
| CN-112470257-A | Method of forming crystallographically stable ferroelectric hafnium zirconium based films for semiconductor devices | 东京毅力科创株式会社 | 2021-03-09 | — | — | CN | disclosed |
| US-20040249096-A1 | Class of metallocenes and method of producing polyethylene | EXXONMOBIL CHEMICAL PATENTS INC. | 2004-12-09 | — | — | US | disclosed |
| US-6803170-B2 | MIXTURE CONTAINING ACID GENERATOR | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-10-12 | — | — | US | disclosed |
| EP-1179749-B1 | Resist composition and method for manufacturing semiconductor device using the resist composition | SEMICONDUCTOR LEADING EDGE TEC (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20020022193-A1 | Resist composition and method for manufacturing semiconductor device using the resist composition | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. | 2002-02-21 | — | — | US | disclosed |
| EP-1179749-A1 | Resist composition and method for manufacturing semiconductor device using the resist composition | Semiconductor Leading Edge Technologies, Inc. (JP) | 2002-02-13 | — | — | EP | disclosed |
| CN-1277625-A | Enhanced dye durability through controlled dye environment | MINNESOTA MINING & MFG (US) | 2000-12-20 | — | — | CN | disclosed |
| US-6010826-A | Resist composition | NIPPON ZEON CO., LTD. (JP) | 2000-01-04 | — | — | US | disclosed |
| CN-1192200-A | Phenylacetic acid derivatives, process and intermediates for their preparation, and their use as pest-killing compositions and fungicides | BASF AG (DE) | 1998-09-02 | — | — | CN | disclosed |
| EP-0786701-A1 | RESIST COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1997-07-30 | — | — | EP | disclosed |