Hexamethylbenzene

Hexamethylbenzene

SCHEMBL336965

C1=CC2C=CC1C2.Cc1c(C)c(C)c(C)c(C)c1C.[Ru]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2935755 0.82
SCHEMBL5611588 0.78
SCHEMBL187216 0.73
SCHEMBL8926692 0.73
SCHEMBL2799117 0.72
Hydrochloric Acid SCHEMBL4494190 0.70
Hydrochloric Acid SCHEMBL6833369 0.70
Hydrochloric Acid SCHEMBL913311 0.70
Hydrochloric Acid SCHEMBL3276518 0.70
Benzene SCHEMBL28326288 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8252377-B2 Organoruthenium compound for use in chemical vapor deposition and chemical vapor deposition using the same TANAKA KIKINZOKU KOGYO K.K. (JP) 2012-08-28 US disclosed
US-8097299-B2 Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound TANAKA KIKINZOKU KOGYO (JP) 2012-01-17 US disclosed
US-20110268878-A1 ORGANORUTHENIUM COMPOUND FOR USE IN CHEMICAL VAPOR DEPOSITION AND CHEMICAL VAPOR DEPOSITION USING THE SAME TANIUCHI JUNICHI 2011-11-03 US disclosed
US-20090238970-A1 ORGANIC RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION, AND CHEMICAL VAPOR DEPOSITION METHOD USING THE ORGANIC RUTHENIUM COMPOUND TANAKA KIKINZOKU KOGYO K.K. (JP) 2009-09-24 US disclosed