⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11335636 | 0.87 | MAPT (0.35) | — | |
| SCHEMBL11348268 | 0.79 | SLC29A1 (0.34) | — | |
| SCHEMBL8351309 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL10953530 | 0.76 | — | — | |
| SCHEMBL9415771 | 0.76 | NPC1 (0.30) | — | |
| SCHEMBL8887739 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL9802633 | 0.69 | — | — | |
| SCHEMBL10879344 | 0.69 | — | — | |
| SCHEMBL8777996 | 0.65 | MEN1 (0.32) | — | |
| SCHEMBL3373374 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1132775-B1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | claimed |
| US-6593054-B2 | Comprises diazo resin, photopolymerizable resin, or photocrosslinkable resin; for increasing adhesion to aluminum substrate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-15 | — | — | US | claimed |
| US-20020064726-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORPORATION (JP) | 2002-05-30 | — | — | US | claimed |
| EP-1132775-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-12 | — | — | EP | claimed |
| US-5080999-A | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide | FUJI PHOTO FILM CO., LTD. (JP) | 1992-01-14 | — | — | US | claimed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | claimed |
| EP-1132775-B1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | disclosed |
| EP-1568491-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-06-10 | — | — | EP | disclosed |
| US-7303849-B2 | Polymer having a hydrophilic graft chain crosslinked by hydrolyzing or polycondensing an alkoxide of Si, Ti, Zr or Al; improved printing stain resistance and printing resistance | FUJIFILM CORPORATION (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7300738-B2 | Azolinyl acetic acid derivative and azolinyl acetic acid derivative containing recording material | FUJIFILM CORPORATION (JP) | 2007-11-27 | — | — | US | disclosed |
| US-20060216639-A1 | Planographic printing plate precursor and method of producing the same | FUJI PHOTO FILM CO., LTD. | 2006-09-28 | — | — | US | disclosed |
| EP-1705006-A1 | Planographic printing plate precursor and method of producing the same | Fuji Photo Film Co., Ltd. (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1120245-B1 | Infrared-sensitive image forming material | FUJI PHOTO FILM CO LTD (JP) | 2005-11-09 | — | — | EP | disclosed |
| US-4447512-A | DIAZONIUM COMPOUND AND O-EPOXYALKYLATED TETRAKIS(HYDROXYPHENYL)ALKANE RESIN, OR ESTERIFICATION PRODUCT | POLYCHROME CORPORATION (US) | 1984-05-08 | — | — | US | disclosed |
| EP-0104863-A2 | Light-sensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1984-04-04 | — | — | EP | disclosed |
| US-4391894-A | BASIC DYE REACTED WITH ORGANIC ACID DISSOLVED IN A PHOTOSENSITIVE DIAZO COMPOSITION | POLYCHROME CORPORATION (US) | 1983-07-05 | — | — | US | disclosed |
| US-4347300-A | CONCURRENT PRODUCTION OF NEGATIVE AND POSITIVE IMAGE; DIAZOTIXZATION; LITHOGRAPHY | POLYCHROME CORPORATION (US) | 1982-08-31 | — | — | US | disclosed |
| US-4326020-A | Method of making positive acting diazo lithographic printing plate | POLYCHROME CORPORATION (US) | 1982-04-20 | — | — | US | disclosed |
| US-4233390-A | WATER SOLUBLE DIAZO RESIN COATED WITH PHOTOPOLYMERIZABLE COMPOSITION | POLYCHROME CORPORATION (US) | 1980-11-11 | — | — | US | disclosed |
| US-4104072-A | Water developable lithographic printing plate having dual photosensitive layering | POLYCHROME CORPORATION (US) | 1978-08-01 | — | — | US | disclosed |