SCHEMBL3386017

SCHEMBL3386017

CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL409141 1.00
SCHEMBL644615 1.00
SCHEMBL28448444 1.00
Ammonia Solution, Strong SCHEMBL28258900 0.98
Fluoride SCHEMBL28491728 0.98
Alcohol SCHEMBL28844309 0.95
Alcohol SCHEMBL28420232 0.95
Hexane SCHEMBL28599316 0.93
SCHEMBL157273 0.92
Isopropyl Alcohol SCHEMBL28466056 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7655365-B2 Wettability variable substrate and wettability variable layer forming composition DAI NIPPON PRINTING CO., LTD. (JP) 2010-02-02 US disclosed
US-20040132946-A1 Wettability variable substrate and wettability variable layer forming composition DAI NIPPON PRINTING CO., LTD. (JP) 2004-07-08 US disclosed