Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | DNM1 | Q05193 | 12/20 | 0.42 |
| ▸ | LSS | P48449 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | RAD52 | P43351 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18139069 | 0.88 | HTT (0.42) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL18140859 | 0.88 | HTT (0.42) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL7892633 | 0.88 | HTT (0.42) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL94004 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL18140571 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL79955 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL94469 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL607638 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL7899851 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 | |
| SCHEMBL18139829 | 0.81 | HTT (0.46) | HTTDNM1LSSKMT2AHSP90AA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2612653-B1 | COMPOSITION FOR CLEANING SCALP AND HEAD HAIR | OTSUKA PHARMA CO LTD (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-9496218-B2 | Integrated circuit device having through-silicon-via structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-11-15 | — | — | US | disclosed |
| US-9062137-B2 | Block copolymer and antistatic agent comprising same | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8742017-B2 | Antistatic agent and resin composition containing same | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20140021633-A1 | Integrated Circuit Device Having Through-Silicon-Via Structure and Method of Manufacturing the Same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-01-23 | — | — | US | disclosed |
| US-20130216491-A1 | COMPOSITION FOR CLEANING SCALP AND HEAD HAIR | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2013-08-22 | — | — | US | disclosed |
| EP-2612653-A1 | COMPOSITION FOR CLEANING SCALP AND HEAD HAIR | Otsuka Pharmaceutical Co., Ltd. (JP) | 2013-07-10 | — | — | EP | disclosed |
| US-20130123434-A1 | BLOCK COPOLYMER AND ANTISTATIC AGENT COMPRISING SAME | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120283386-A1 | ANTISTATIC AGENT AND RESIN COMPOSITION CONTAINING SAME | TOHO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20100084277-A1 | Composition for copper plating and associated methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-04-08 | — | — | US | disclosed |