⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL483933 | 1.00 | — | — | |
| SCHEMBL31207125 | 0.82 | — | — | |
| SCHEMBL3200976 | 0.82 | — | — | |
| SCHEMBL36463 | 0.82 | — | — | |
| SCHEMBL7544100 | 0.82 | — | — | |
| SCHEMBL7543167 | 0.82 | — | — | |
| SCHEMBL7648855 | 0.82 | — | — | |
| SCHEMBL11676053 | 0.82 | — | — | |
| SCHEMBL19064305 | 0.67 | — | — | |
| SCHEMBL1462145 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8304349-B2 | Method to integrate gate etching as all-in-one process for high K metal gate | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2012-11-06 | — | — | US | disclosed |
| US-20100041236-A1 | NOVEL METHOD TO INTEGRATE GATE ETCHING AS ALL-IN-ONE PROCESS FOR HIGH K METAL GATE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2010-02-18 | — | — | US | disclosed |