⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8272287 | 1.00 | — | — | |
| SCHEMBL92041 | 1.00 | — | — | |
| Methyl Alcohol SCHEMBL1660069 | 0.93 | — | — | |
| Formaldehyde SCHEMBL27905896 | 0.90 | — | — | |
| Ethylene Glycol SCHEMBL27626984 | 0.87 | TSHR (0.35) | — | |
| Bicarbonate SCHEMBL29135929 | 0.85 | FFAR3 (0.33) | — | |
| Acetaldehyde SCHEMBL27398514 | 0.85 | — | — | |
| Bicarbonate SCHEMBL28959796 | 0.85 | FFAR3 (0.33) | — | |
| SCHEMBL27859062 | 0.85 | — | — | |
| Methyl Alcohol SCHEMBL4558081 | 0.83 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 418 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230280651-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| EP-3188764-B1 | POLYMER AND CONTRAST AGENT FOR PHOTOACOUSTIC IMAGING INCLUDING THE POLYMER | CANON KK (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-9939555-B2 | Cinnamic acid derivative, polymer thereof, and liquid crystal alignment layer comprising cured product thereof | DIC CORPORATION (JP) | 2018-04-10 | — | — | US | disclosed |
| US-9845292-B2 | Selective FKBP51 ligands for treatment of psychiatric disorders | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. (DE) | 2017-12-19 | — | — | US | disclosed |
| US-20170320870-A1 | COMPOUNDS | MEDICAL RESEARCH COUNCIL TECHNOLOGY (GB) | 2017-11-09 | — | — | US | disclosed |
| US-20170320870-A1 | COMPOUNDS | MEDICAL RESEARCH COUNCIL TECHNOLOGY (GB) | 2017-11-09 | — | — | US | disclosed |
| US-20170315442-A1 | NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-02 | — | — | US | disclosed |
| EP-2900223-B1 | NOVEL COMPOUNDS THAT ARE ERK INHIBITORS | MERCK SHARP & DOHME (US) | 2017-10-25 | — | — | EP | disclosed |
| US-20070128555-A1 | Novel ester compound, polymer, resist composition, and patterning process | CENTRAL GLASS CO., LTD. | 2007-06-07 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| EP-1741705-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| WO-2005049616-A1 | 5,7-DIAMINOPYRAZOLO [4,3-d] PYRIMIDINES WITH PDE-5 INHIBITING ACTIVITY | PFIZER LIMITED (GB) | 2005-06-02 | — | — | WO | disclosed |