SCHEMBL3416403

SCHEMBL3416403

[O-2].[O-2].[Pt].[Ru+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL658963 0.87
SCHEMBL6420669 0.87
SCHEMBL5703964 0.87
SCHEMBL7635100 0.87
SCHEMBL29360125 0.82
SCHEMBL31330335 0.82
SCHEMBL29875652 0.82
SCHEMBL1727116 0.82
SCHEMBL2254018 0.82
SCHEMBL708004 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116207410-A Neutral zinc air fiber battery and preparation method thereof 南京大学 2023-06-02 CN claimed
US-5914507-A PIEZOELECTRIC DEVICE REGENTS OF THE UNIVERSITY OF MINNESOTA (US) 1999-06-22 US claimed
CN-116207410-A Neutral zinc air fiber battery and preparation method thereof 南京大学 2023-06-02 CN disclosed
CN-116207410-A Neutral zinc air fiber battery and preparation method thereof 南京大学 2023-06-02 CN disclosed
US-20210025062-A1 PHOTOELECTROCHEMICAL DEVICE, MONOLITHIC WATER SPLITTING DEVICE AND METHODS OF PRODUCTION KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (SA) 2021-01-28 US disclosed
CN-102160148-B Depositing system, ALD system, CVD system, deposition process, ALD method and CVD method MICRON TECHNOLOGY, INC. (US) 2015-12-16 CN disclosed
CN-102160148-A Deposition systems, ald systems, cvd systems, deposition methods, als methods and cvd methods MICRON TECHNOLOGY INC 2011-08-17 CN disclosed
WO-2010033318-A2 DEPOSITION SYSTEMS, ALD SYSTEMS, CVD SYSTEMS, DEPOSITION METHODS, ALS METHODS AND CVD METHODS MICRON TECHNOLOGY, INC. (US) 2010-03-25 WO disclosed
US-20100075037-A1 Deposition Systems, ALD Systems, CVD Systems, Deposition Methods, ALD Methods and CVD Methods MICRON SEMICONDUCTOR PRODUCTS, INC. 2010-03-25 US disclosed
US-7618890-B2 Methods for forming conductive structures and structures regarding same MICRON TECHNOLOGY, INC. (US) 2009-11-17 US disclosed
US-20090061080-A1 METHODS FOR FORMING CONDUCTIVE STRUCTURES AND STRUCTURES REGARDING SAME MICRON TECHNOLOGY, INC. (US) 2009-03-05 US disclosed
CN-1205685-C Fuel cell with silicon substrate NEATH POWER SYSTEMS INC (US) 2005-06-08 CN disclosed
EP-1301341-A4 POLYMER COATINGS MICROCOATING TECHNOLOGIES INC (US) 2004-07-14 EP disclosed
US-20040058491-A1 Methods for forming conductive structures and structures regarding same MICRON TECHNOLOGY, INC. 2004-03-25 US disclosed
US-20030215644-A1 Polymer coatings SILICON VALLEY BANK 2003-11-20 US disclosed
EP-1301341-A1 POLYMER COATINGS MicroCoating Technologies, Inc. (US) 2003-04-16 EP disclosed
US-6534357-B1 Methods for forming conductive structures and structures regarding same MICRON TECHNOLOGY, INC. 2003-03-18 US disclosed
US-20030001190-A1 Methods for forming conductive structures and structures regarding same MICRON TECHNOLOGY, INC. 2003-01-02 US disclosed
WO-2002002320-A1 POLYMER COATINGS MICROCOATING TECHNOLOGIES, INC. (US) 2002-01-10 WO disclosed
US-4294608-A REDUCED METALS COPRECIPITATE USED AS REDOX CATALYSTS IN FUEL CELLS AND ELECTROLYSIS GENERAL ELECTRIC COMPANY (US) 1981-10-13 US disclosed