SCHEMBL3424809

SCHEMBL3424809

CCO[Si](CCC1CCC2OC2C1)(OCC)OCC.CO[Si](CCCN)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5960592 1.00
SCHEMBL6740733 0.94
SCHEMBL6755355 0.92 PTGS1 (0.32)
SCHEMBL1627163 0.92 PTGS1 (0.32)
SCHEMBL5880723 0.90 PTGS1 (0.31)
SCHEMBL28871167 0.88 PTGS1 (0.30)
SCHEMBL4360349 0.88 PTGS1 (0.30)
SCHEMBL3300369 0.88 PTGS1 (0.32)
SCHEMBL3294819 0.88 PTGS1 (0.32)
SCHEMBL15378912 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2138525-B1 EPOXY SILICONE AND METHOD FOR PRODUCTION THEREOF, AND CURABLE RESIN COMPOSITION USING THE SAME AND USE THEREOF ASAHI KASEI CHEMICALS CORP (JP) 2012-12-26 EP disclosed
US-8222348-B2 Epoxy silicone and process for producing same, and curable mix composition using same and use thereof ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-07-17 US disclosed
US-20100120975-A1 EPOXY SILICONE AND PROCESS FOR PRODUCING SAME, AND CURABLE MIX COMPOSITION USING SAME AND USE THEREOF ASAHI KASEI CHEMICALS CORPORATION (JP) 2010-05-13 US disclosed
EP-2138525-A1 EPOXY SILICONE AND METHOD FOR PRODUCTION THEREOF, AND CURABLE RESIN COMPOSITION USING THE SAME AND USE THEREOF Asahi Kasei Chemicals Corporation (JP) 2009-12-30 EP disclosed