SCHEMBL3431994

SCHEMBL3431994

O=C(OCCC(F)(F)C(F)(F)Br)C1C2CC3C(OC(=O)C31)C2O

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethaneperoxoic Acid SCHEMBL3433051 0.94 KMT2A (0.30) KMT2A
SCHEMBL13011183 0.89 MEN1 (0.30) KMT2AMEN1
SCHEMBL17012723 0.87
SCHEMBL3431693 0.86
SCHEMBL3434502 0.86
SCHEMBL13013864 0.85
Hydrogen Peroxide SCHEMBL3434217 0.85
SCHEMBL14983818 0.84 KMT2A (0.33) KMT2AMEN1
SCHEMBL3433050 0.83
SCHEMBL962460 0.81 FABP7 (0.39) KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2267532-B1 Photoacid generators and photoresists comprising same ROHM & HAAS ELECT MAT (US) 2015-08-19 EP disclosed
EP-2267532-B1 Photoacid generators and photoresists comprising same ROHM & HAAS ELECT MAT (US) 2015-08-19 EP disclosed
US-8338077-B2 Photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-25 US disclosed
US-8338077-B2 Photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-25 US disclosed
EP-2267532-A1 Photoacid generators and photoresists comprising same Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-29 EP disclosed
US-20100323294-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-12-23 US disclosed
US-20100323294-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-12-23 US disclosed