SCHEMBL343500

SCHEMBL343500

[CH2]C(C)[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9022326 0.72
SCHEMBL17556608 0.72
SCHEMBL2995 0.70
SCHEMBL8781203 0.68
SCHEMBL6131365 0.68
SCHEMBL2161000 0.67
Hydrochloric Acid SCHEMBL27660045 0.67
SCHEMBL1483243 0.67
SCHEMBL121159 0.67
SCHEMBL28120931 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-H08509967-A 1996-10-22 JP claimed
EP-0690847-A1 HETEROCYCLIC COMPOUNDS AS PLATELET AGGREGATION INHIBITORS ZENECA LIMITED (GB) 1996-01-10 EP claimed
WO-1994022835-A2 HETEROCYCLIC COMPOUNDS AS PLATELET AGGREGATION INHIBITORS ZENECA LIMITED (GB) 1994-10-13 WO claimed
CN-114656378-A Cationic sulfonamide amino lipids and amphiphilic zwitterionic amino lipids 得克萨斯州大学系统董事会 2022-06-24 CN disclosed
CN-110072862-B Bicyclic nitrogen-containing heterocyclic derivative and pharmaceutical composition containing the same 盐野义制药株式会社 2022-05-13 CN disclosed
EP-2414896-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORP (JP) 2020-11-11 EP disclosed
CN-111801330-A Fused ring compounds having dopamine D3 receptor antagonism 盐野义制药株式会社 2020-10-20 CN disclosed
US-10604658-B2 Organic silicon compound, surface treatment agent containing same, resin composition containing same, and gel or cured product of same DOW TORAY CO., LTD. (JP) 2020-03-31 US disclosed
EP-2356516-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORP (JP) 2017-10-25 EP disclosed
EP-2356517-B1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORP (JP) 2017-01-25 EP disclosed
US-20160209747-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2016-07-21 US disclosed
US-5250639-A Polyaniline derivatives and their production process TOMOEGAWA PAPER CO., LTD. (JP) 1993-10-05 US disclosed
US-5144035-A Chemical intermediates for platelet activating factor antagonists YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1992-09-01 US disclosed
US-5093370-A Useful prior to insertion of tracheotomy tube or discission TOBISHI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) 1992-03-03 US disclosed
US-4948795-A PLATELET ACTIVATING FACTOR ANTAGONISTS YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1990-08-14 US disclosed
EP-0350145-A2 Pyridylthiazolidine carboxamide derivatives and their intermediates and production of both YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1990-01-10 EP disclosed
US-4404278-A RADIOIMMUNOLOGY; FLUORESCENCE; ANTIBODIES SYVA COMPANY (US) 1983-09-13 US disclosed
US-4350692-A CEPHALOSPORINS FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1982-09-21 US disclosed
EP-0052921-A1 Methods and compositions for assaying for the production of 1,4-dihydropyridyl SYVA COMPANY (US) 1982-06-02 EP disclosed
US-4046636-A FOR DETERMINATION OF BENZDIAZACYCLOHEPTANE DRUGS SYVA COMPANY (US) 1977-09-06 US disclosed