⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3455588 | 0.85 | APP (0.42) | — | |
| SCHEMBL14030656 | 0.83 | APP (0.41) | — | |
| Formic Acid SCHEMBL14713555 | 0.80 | APP (0.38) | — | |
| SCHEMBL2532154 | 0.77 | — | — | |
| Formic Acid Methyl Ester SCHEMBL14713573 | 0.77 | APP (0.35) | — | |
| SCHEMBL15490368 | 0.74 | — | — | |
| SCHEMBL119164 | 0.74 | — | — | |
| SCHEMBL21297649 | 0.74 | — | — | |
| SCHEMBL11508393 | 0.73 | PTGS1 (0.33) | — | |
| SCHEMBL8312885 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108812681-B | Pesticidal compositions and methods related thereto | 美国陶氏益农公司 | 2021-02-26 | — | — | CN | claimed |
| US-20230159477-A1 | PROCESSES FOR PREPARING OXATHIAZIN-LIKE COMPOUNDS | GEISTLICH PHARMA AG (CH) | 2023-05-25 | — | — | US | disclosed |
| CN-105576282-B | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery using same | 三菱化学株式会社 | 2018-11-06 | — | — | CN | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| EP-2533344-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION, ELECTROCHEMICAL ELEMENT USING SAME, AND ALKYNYL COMPOUND USED THEREFOR | Ube Industries, Ltd. (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-20100143830-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| EP-0840741-B1 | PNA-DNA CHIMERAS AND PNA SYNTHONS FOR THEIR PREPARATION | PERSEPTIVE BIOSYSTEMS INC (US) | 2004-04-28 | — | — | EP | disclosed |
| EP-0215124-B1 | SILVER HALIDE PHOTOGRAPHIC PHOTO-SENSITIVE MATERIAL | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-04 | — | — | EP | disclosed |
| US-5004674-A | Organic compound which releases a free radical on contact with light rays and a compound which changes in absorption spectra due to free radical in a layer on a support | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-02 | — | — | US | disclosed |
| EP-0409117-A1 | Silver halide photographic material | KONICA CORPORATION (JP) | 1991-01-23 | — | — | EP | disclosed |
| US-4925782-A | Silver halide photographic light-sensitive element containing water soluble dye compounds | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-15 | — | — | US | disclosed |
| US-4879204-A | HIGH CONTRAST | FUJI PHOTO FILM CO., LTD. (JP) | 1989-11-07 | — | — | US | disclosed |
| EP-0215124-A1 | SILVER HALIDE PHOTOGRAPHIC PHOTO-SENSITIVE MATERIAL | FUJI PHOTO FILM CO., LTD. (JP) | 1987-03-25 | — | — | EP | disclosed |
| US-4152189-A | Method of utilizing polyacrylic hot-melt adhesives | ROHM AND HAAS COMPANY (US) | 1979-05-01 | — | — | US | disclosed |
| US-4147850-A | ACRYLATE, UNSATURATED AMINE OR ACID, WATER | ROHM AND HAAS COMPANY (US) | 1979-04-03 | — | — | US | disclosed |
| US-4065523-A | COPOLYMERIZATION | ROHM AND HAAS COMPANY (US) | 1977-12-27 | — | — | US | disclosed |
| US-4045517-A | Polyacrylic hot melt adhesives | ROHM AND HAAS COMPANY (US) | 1977-08-30 | — | — | US | disclosed |