SCHEMBL345826

SCHEMBL345826

Cc1ccc(Cl)c(N)c1N

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.48
POLB P06746 1/20 0.46
PLA2G7 Q13093 1/20 0.42
CD44 P16070 2/20 0.40
ALDH1A1 P00352 4/20 0.37
NOS3 P29474 1/20 0.37
NOS2 P35228 1/20 0.37
MAPT P10636 3/20 0.37
LMNA P02545 2/20 0.37
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
HPGD P15428 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TSHR P16473 2/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CASP1 P29466 1/20 0.35
TP53 P04637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31568962 1.00 CYP3A4 (0.48) CYP3A4POLBPLA2G7CD44ALDH1A1
SCHEMBL409314 0.82 POLB (0.61) CYP3A4POLBCD44ALDH1A1NOS3
SCHEMBL2359630 0.82 TSHR (0.47) CYP3A4ALDH1A1LMNAGAATSHR
SCHEMBL10417671 0.81 CYP3A4 (0.46) CYP3A4POLBPLA2G7CD44ALDH1A1
SCHEMBL1638904 0.81 CYP3A4 (0.46) CYP3A4POLBPLA2G7CD44ALDH1A1
SCHEMBL5768842 0.81 POLB (0.56) CYP3A4POLBPLA2G7CD44ALDH1A1
SCHEMBL7980066 0.81 CYP3A4 (0.46) CYP3A4POLBPLA2G7CD44ALDH1A1
SCHEMBL30759920 0.81 POLB (0.56) CYP3A4POLBPLA2G7CD44ALDH1A1
Hydrochloric Acid SCHEMBL8125648 0.78 POLB (0.58) CYP3A4POLBCD44ALDH1A1NOS3
SCHEMBL101942 0.77 CYP3A4 (0.43) CYP3A4POLBPLA2G7CD44ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11813713-B2 Chemical mechanical polishing pad and polishing method ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-11-14 US claimed
US-11806830-B2 Formulations for chemical mechanical polishing pads and CMP pads made therewith ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-11-07 US claimed
CN-114800255-A Formulation for chemical mechanical polishing pad and CMP pad made therefrom 罗门哈斯电子材料CMP控股股份有限公司 2022-07-29 CN claimed
CN-114770369-A Formulation for chemical mechanical polishing pad with high planarization efficiency and CMP pad made with the same 罗门哈斯电子材料CMP控股股份有限公司 2022-07-22 CN claimed
CN-114770368-A Chemical mechanical polishing pad and polishing method 罗门哈斯电子材料CMP控股股份有限公司 2022-07-22 CN claimed
US-20220226958-A1 FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS WITH HIGH PLANARIZATION EFFICIENCY AND CMP PADS MADE THEREWITH U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-20220226959-A1 FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS AND CMP PADS MADE THEREWITH U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-20220226957-A1 CHEMICAL MECHANICAL POLISHING PAD AND POLISHING METHOD U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-07-21 US claimed
US-10464187-B2 High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2019-11-05 US claimed
US-20190168356-A1 HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INITIATED POLYOL CONTAINING CURATIVES U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-06-06 US claimed
US-6375966-B1 Polyurethane/polyurea matrices for the delivery of active agents SCENTED TECHNOLOGIES, LLC 2002-04-23 US claimed
WO-2001091551-A1 POLYURETHANE/POLYUREA MATRICES FOR THE DELIVERY OF ACTIVE AGENTS FLAVOR & FRAGRANCE SPECIALTIES (US) 2001-12-06 WO claimed
US-5821316-A POLYETHERURETHANES AND POLYUREAURETHANES FORMED BY CONDENSATION POLYMERIZATION OF DIISOCYANATES AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-10-13 US claimed
EP-0855414-A1 Polyurethane prepolymers for making elastomers having improved dynamic properties AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-07-29 EP claimed
EP-0283868-A2 Process for producing polyurethane/urea elastomers AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-09-28 EP claimed
US-4722989-A URETHANE-LINKED TOLUENEDIISOCYANATE, DIAMINE CHAIN EXTENSION AIR PRODUCTS AND CHEMICALS, INC. (US) 1988-02-02 US claimed
US-4549007-A REACTION INJECTION MOLDING OF POLYURETHANES-POLYUREAS GAF CORPORATION (US) 1985-10-22 US claimed
US-4523004-A 1,4-BUTANEDIOL AND MONOSUBSTITUTED TOLUENE DIAMINE GAF CORPORATION (US) 1985-06-11 US claimed
US-4507459-A AROMATIC DIAMINE CHAIN EXTENDER, TIRES AIR PRODUCTS AND CHEMICALS, INC. (US) 1985-03-26 US claimed
EP-0102203-A1 Diamine/diol chain extender blends for RIM process GAF CORPORATION (US) 1984-03-07 EP claimed