SCHEMBL3459463

SCHEMBL3459463

FC(F)(F)C1(C(F)(F)F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Perfluorocyclobutane SCHEMBL10391737 0.96 MEN1 (0.33)
SCHEMBL297814 0.96 MEN1 (0.33)
SCHEMBL6885374 0.96 MEN1 (0.33)
SCHEMBL555524 0.96 MEN1 (0.33)
SCHEMBL149623 0.96 MEN1 (0.33)
SCHEMBL3459239 0.91
SCHEMBL3458745 0.87
SCHEMBL1280066 0.87 MEN1 (0.33)
SCHEMBL3458494 0.87
SCHEMBL3459613 0.84 MEN1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110800087-B Substrate processing method, substrate processing liquid, and substrate processing apparatus 株式会社斯库林集团 2024-03-19 CN disclosed
CN-116864419-A Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-10-10 CN disclosed
CN-116825612-A Substrate processing method and substrate processing device 株式会社斯库林集团 2023-09-29 CN disclosed
CN-109904093-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-08-29 CN disclosed
CN-109545655-B Substrate processing method and substrate processing device 株式会社斯库林集团 2023-08-11 CN disclosed
CN-110168704-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2023-07-25 CN disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
CN-109309032-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2022-07-15 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
CN-110800087-A Substrate processing method, substrate processing liquid, and substrate processing apparatus 株式会社斯库林集团 2020-02-14 CN disclosed
US-20190333755-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-10-31 US disclosed
US-20190176179-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-06-13 US disclosed
US-20190091736-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-03-28 US disclosed
US-20190030576-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-31 US disclosed
EP-3435405-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-30 EP disclosed
US-10153181-B2 Substrate treating apparatus and substrate treating method SCREEN Holdings Co., Ltd. (JP) 2018-12-11 US disclosed
US-20170345683-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-30 US disclosed
EP-3249682-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-29 EP disclosed
US-7704746-B1 Method of detecting leakage from geologic formations used to sequester CO2 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 2010-04-27 US disclosed