Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.49 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9749544 | 0.75 | GAA (0.53) | GAAPKMHIF1AKDM4EALDH1A1 | |
| SCHEMBL27396133 | 0.73 | CYP2D6 (0.47) | GAAALDH1A1MAPTKMT2A | |
| SCHEMBL9420976 | 0.72 | GAA (0.53) | GAAPKMHIF1AKDM4EALDH1A1 | |
| SCHEMBL6758128 | 0.71 | PTPN22 (0.43) | GAAPKMHIF1AKDM4EALDH1A1 | |
| SCHEMBL6010301 | 0.69 | — | — | |
| SCHEMBL29354413 | 0.69 | — | — | |
| SCHEMBL130289 | 0.69 | PTPN22 (0.58) | — | |
| SCHEMBL15345708 | 0.67 | KDM4E (0.55) | GAAKDM4EALDH1A1MAPT | |
| SCHEMBL2167788 | 0.67 | — | — | |
| SCHEMBL1086963 | 0.67 | PTPN22 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7659051-B2 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2010-02-09 | — | — | US | disclosed |
| WO-2008082236-A1 | POLYMER HAVING ANTIREFLECTIVE PROPERTIES, HARDMASK COMPOSITION INCLUDING THE SAME, AND PROCESS FOR FORMING A PATTERNED MATERIAL LAYER | CHEIL INDUSTRIES INC. (KR) | 2008-07-10 | — | — | WO | disclosed |
| US-20080160460-A1 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2008-07-03 | — | — | US | disclosed |