SCHEMBL346728

SCHEMBL346728

[CH2]CCCCCCCCCCCCCCCCCc1cc(C(=O)O)cc2c1C(=O)OC2=O

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F13A1 P00488 3/20 0.33
TTR P02766 4/20 0.31
MEN1 O00255 2/20 0.31
ALDH1A1 P00352 2/20 0.31
POLB P06746 2/20 0.31
CYP3A4 P08684 2/20 0.31
MAPT P10636 2/20 0.31
HPGD P15428 2/20 0.31
RECQL P46063 2/20 0.31
KMT2A Q03164 2/20 0.31
TDP1 Q9NUW8 2/20 0.31
KDM4E B2RXH2 1/20 0.31
LMNA P02545 1/20 0.31
BCHE P06276 1/20 0.31
HSP90AA1 P07900 1/20 0.31
HSP90AB1 P08238 1/20 0.31
THRB P10828 1/20 0.31
ALOX15 P16050 1/20 0.31
TSHR P16473 1/20 0.31
ALOX12 P18054 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL346445 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL347024 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL346555 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL345938 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL345929 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL346524 1.00 F13A1 (0.33) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL3747455 0.93 F13A1 (0.38) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL8503573 0.93 F13A1 (0.38) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL7896830 0.93 F13A1 (0.38) F13A1TTRMEN1ALDH1A1POLB
SCHEMBL3680611 0.85 TTR (0.37) TTRMEN1ALDH1A1POLBCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023042305-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG 株式会社レゾナック 2023-03-23 WO disclosed
US-10580640-B2 Kit and laminate FUJIFILM CORPORATION (JP) 2020-03-03 US disclosed
US-10575402-B2 Resin composition, wiring layer laminate for semiconductor, and semiconductor device HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-02-25 US disclosed
US-10428253-B2 Photosensitive resin composition, film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, and semiconductor device HITACHI CHEMICAL COMPANY, LTD (JP) 2019-10-01 US disclosed
US-20190281697-A1 RESIN COMPOSITION, WIRING LAYER LAMINATE FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2019-09-12 US disclosed
US-10287458-B2 Laminate for treatment of a wafer device, temporary adhesion composition, and temporary adhesion film FUJIFILM CORPORATION (JP) 2019-05-14 US disclosed
US-20180016471-A1 LAMINATE, TEMPORARY ADHESION COMPOSITION, AND TEMPORARY ADHESION FILM FUJIFILM CORPORATION (JP) 2018-01-18 US disclosed
US-20180012751-A1 KIT AND LAMINATE FUJIFILM CORPORATION (JP) 2018-01-11 US disclosed
US-9781836-B2 Thermosetting resin composition, method for forming protective film for flexible wiring board, and flexible wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2017-10-03 US disclosed
US-20160160102-A1 PHOTOSENSITIVE RESIN COMPOSITION, FILM ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, AND SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2016-06-09 US disclosed
EP-1235276-A1 Semiconductor device and process for fabrication thereof HITACHI CHEMICAL CO., LTD. (JP) 2002-08-28 EP disclosed
US-6372859-B1 MAKING A PASTE BY MIXING A SOLUTION OF HEAT-RESISTANT RESIN A IN A SOLVENT, FINE PARTICLES OF RESIN B INSOLUBLE IN THE SOLVENT BUT SOLUBLE UPON HEATING; HEATING TO DISSOLVE; COOLING TO DEPOSIT OR DISPERSE THE PARTICLES; CURING HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-04-16 US disclosed
US-20010035533-A1 Semiconductor device and process for fabrication thereof TAKEDA SHINJI (JP) 2001-11-01 US disclosed
US-20010016384-A1 Semiconductor device and process for fabrication thereof TAKEDA SHINJI (JP) 2001-08-23 US disclosed
US-20010009780-A1 Semiconductor device and process for fabrication thereof TAKEDA SHINJI (JP) 2001-07-26 US disclosed
EP-1032036-A2 Semiconductor device and process for fabrication thereof HITACHI CHEMICAL CO., LTD. (JP) 2000-08-30 EP disclosed
EP-0984051-A1 HEAT-RESISTANT ADHESIVES AND SEMICONDUCTOR DEVICES PRODUCED THEREWITH HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-03-08 EP disclosed
EP-0837498-A1 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE HITACHI CHEMICAL CO., LTD. (JP) 1998-04-22 EP disclosed
US-5667899-A SELF-SUPPORTING BONDING FILM OF POLYIMIDES HITACHI CHEMICAL CO. LTD. (JP) 1997-09-16 US disclosed
US-5605763-A POLYIMIDE; SEMICONDUCTORS HITACHI CHEMICAL COMPANY LTD. (JP) 1997-02-25 US disclosed