⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3475159 | 0.72 | — | — | |
| SCHEMBL3473100 | 0.72 | — | — | |
| SCHEMBL3473024 | 0.72 | — | — | |
| SCHEMBL3475002 | 0.72 | — | — | |
| SCHEMBL3474893 | 0.68 | — | — | |
| SCHEMBL9320613 | 0.67 | — | — | |
| SCHEMBL440650 | 0.67 | — | — | |
| SCHEMBL2144167 | 0.67 | — | — | |
| SCHEMBL1066835 | 0.65 | — | — | |
| SCHEMBL1065429 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101111501-B | Cyclic siloxane compound, si-containing film-forming material, and use thereof | TOSOH CORP | 2015-07-15 | — | — | CN | disclosed |
| US-8513448-B2 | Cyclic siloxane compound, a material for forming Si-containing film, and its use | TOSOH CORPORATION (JP) | 2013-08-20 | — | — | US | disclosed |
| EP-2256123-B1 | Cyclic siloxane compound, a material for forming Si-containing film, and its use | TOSOH CORP (JP) | 2013-08-14 | — | — | EP | disclosed |
| EP-2256123-A2 | Cyclic siloxane compound, a material for forming Si-containing film, and its use | Tosoh Corporation (JP) | 2010-12-01 | — | — | EP | disclosed |
| US-20100052114-A1 | CYCLIC SILOXANE COMPOUND, A MATERIAL FOR FORMING SI-CONTAINING FILM, AND ITS USE | TOSOH CORPORATION (JP) | 2010-03-04 | — | — | US | disclosed |
| EP-1845100-A1 | CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF | Tosoh Corporation (JP) | 2007-10-17 | — | — | EP | disclosed |