SCHEMBL3475784

SCHEMBL3475784

C=C[SiH2]CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13606846 0.83
SCHEMBL5088901 0.81
SCHEMBL3433501 0.79
SCHEMBL4517086 0.77 TSHR (0.46)
SCHEMBL8820688 0.77 TSHR (0.46)
SCHEMBL323484 0.72
SCHEMBL2268148 0.69
SCHEMBL2267190 0.69 MEN1 (0.40)
SCHEMBL29277799 0.69
SCHEMBL7576125 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111875735-A Silane polymer for bonding lithium ion battery negative electrode and preparation method thereof 湖北大学 2020-11-03 CN claimed
JP-62073930-A None JP disclosed
CN-117355632-A Method for producing planarizing film, material for planarizing film, and planarizing film 东曹株式会社 2024-01-05 CN disclosed
CN-111875735-B Silane polymer for bonding lithium ion battery negative electrode and preparation method thereof 湖北大学 2022-08-02 CN disclosed
CN-111875735-A Silane polymer for bonding lithium ion battery negative electrode and preparation method thereof 湖北大学 2020-11-03 CN disclosed
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed
US-8182868-B2 Encapsulation of particulate contamination MAXTOR CORPORATION (US) 2012-05-22 US disclosed
CN-102206304-A Conjugated diene polymer, conjugated diene polymer composition, and method for producing conjugated diene polymer SUMITOMO CHEMICAL CO 2011-10-05 CN disclosed
US-20100178422-A1 ENCAPSULATION OF PARTICULATE CONTAMINATION MAXTOR CORPORATION (US) 2010-07-15 US disclosed
US-7625636-B2 Insulating-film forming composition, insulating film and preparation process thereof FUJIFILM CORPORATION (JP) 2009-12-01 US disclosed
EP-0404519-B1 A process for producing a high-stiffness polypropylene CHISSO CORP (JP) 1996-08-07 EP disclosed
EP-0714952-A1 Curable siloxane polymer composition and method of curing DOW CORNING ASIA, Ltd. (JP) 1996-06-05 EP disclosed
EP-0604401-A2 Production of a catalyst component for producing crystalline polymers CHISSO CORPORATION (JP) 1994-06-29 EP disclosed
EP-0564004-A1 A highly stereoregular polypropylene CHISSO CORPORATION (JP) 1993-10-06 EP disclosed
US-5173540-A Coordination catalyst comprising titanium compound, organo aluminum compound electron donor and a polymer support; transparent, voidless films produced CHISSO CORPORATION (JP) 1992-12-22 US disclosed
US-5077341-A Using coordination catalyst CHISSO CORPORATION (JP) 1991-12-31 US disclosed
EP-0404519-A2 A process for producing a high-stiffness polypropylene CHISSO CORPORATION (JP) 1990-12-27 EP disclosed
EP-0395391-A2 Catalyst component for producing crystalline polymers and a process for producing the catalyst CHISSO CORPORATION (JP) 1990-10-31 EP disclosed
JP-S6273930-A STICKING METHOD FOR SYNTHETIC FIBER WOVEN CLOTH AND SILICONE RUBBER BANDO CHEM IND LTD 1987-04-04 JP disclosed
JP-S06273930-A 0001-01-01 JP disclosed