⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29009560 | 0.84 | — | — | |
| SCHEMBL17732447 | 0.80 | TSHR (0.46) | — | |
| SCHEMBL8680820 | 0.80 | TSHR (0.46) | — | |
| SCHEMBL3481728 | 0.74 | — | — | |
| SCHEMBL1579942 | 0.72 | — | — | |
| SCHEMBL8513685 | 0.72 | — | — | |
| SCHEMBL29860680 | 0.71 | — | — | |
| SCHEMBL676154 | 0.71 | — | — | |
| SCHEMBL3482356 | 0.70 | — | — | |
| SCHEMBL3682865 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8877286-B2 | Method for producing optical film | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20130265529-A1 | OPTICAL FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8304025-B2 | Optical film, polarizing plate, image display, and manufacturing method of optical film | FUJIFILM CORPORATION (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120237673-A1 | METHOD FOR PRODUCING OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-8206779-B2 | Method for producing laminate, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20110244218-A1 | Coating composition, optical film, polarizing plate, and image display apparatus | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110217452-A1 | OPTICAL FILM, POLARIZING PLATE, IMAGE DISPLAY, AND MANUFACTURING METHOD OF OPTICAL FILM | FUJIFILM CORPORATION (JP) | 2011-09-08 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7015292-B2 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20050038214-A1 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-3946131-A | Glass fibers coated with silicon containing aminimide compounds | OWENS-CORNING FIBERGLAS CORPORATION (US) | 1976-03-23 | — | — | US | disclosed |