SCHEMBL3481628

SCHEMBL3481628

C=C[Si](C=C)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13621300 0.97
SCHEMBL13621366 0.97
SCHEMBL5067802 0.89
SCHEMBL3482067 0.89
SCHEMBL3481328 0.89
SCHEMBL31304081 0.81
SCHEMBL3481405 0.78
SCHEMBL9490370 0.77
SCHEMBL536602 0.76
SCHEMBL2178197 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116804120-A Preparation method for constructing organic silicon-based composite material with three-dimensional heat conduction network based on liquid/solid two-phase filler 浙江理工大学 2023-09-26 CN disclosed
CN-109661435-B Curable resin composition, cured product thereof, and semiconductor device 日亚化学工业株式会社 2022-04-12 CN disclosed
US-10947384-B2 Curable resin composition, cured product thereof, and semiconductor device DAICEL CORPORATION (JP) 2021-03-16 US disclosed
US-20190218346-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND SEMICONDUCTOR DEVICE DAICEL CORPORATION (JP) 2019-07-18 US disclosed
EP-2061115-B1 LITHIUM DIFLUOROPHOSPHATE, ELECTROLYTIC SOLUTION CONTAINING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING NONAQUEOUS ELECTROLYTIC SOLUTION, NONAQUEOUS ELECTROLYTIC SOLUTION, AND NONAQUEOUS-ELECTROLYTIC-SOLUTION SECONDARY CELL EMPLOYING THE SAME MITSUBISHI CHEM CORP (JP) 2015-04-01 EP disclosed
EP-2057239-B1 BRANCHED POLYSILOXANE COMPOSITION MOMENTIVE PERFORMANCE MAT INC (US) 2015-03-04 EP disclosed
EP-2057238-B1 COMPOSITION CONTAINING ANTI-MISTING COMPONENT MOMENTIVE PERFORMANCE MAT INC (US) 2012-10-10 EP disclosed
US-7649071-B2 Branched polysiloxane composition MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2010-01-19 US disclosed
US-20090286155-A1 LITHIUM DIFLUOROPHOSPHATE, ELECTROLYTE CONTAINING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING NONAQUEOUS ELECTROLYTE, NONAQUEOUS ELECTROLYTE, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2009-11-19 US disclosed
US-20090286155-A1 LITHIUM DIFLUOROPHOSPHATE, ELECTROLYTE CONTAINING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING LITHIUM DIFLUOROPHOSPHATE, PROCESS FOR PRODUCING NONAQUEOUS ELECTROLYTE, NONAQUEOUS ELECTROLYTE, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2009-11-19 US disclosed
EP-2057239-A2 BRANCHED POLYSILOXANE COMPOSITION Momentive Performance Materials Inc. (US) 2009-05-13 EP disclosed
EP-2057238-A2 COMPOSITION CONTAINING ANTI-MISTING COMPONENT Momentive Performance Materials Inc. (US) 2009-05-13 EP disclosed
WO-2008140762-A2 COMPOSITION CONTAINING ANTI-MISTING COMPONENT OF REDUCED MOLECULAR WEIGHT AND VISCOSITY MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-11-20 WO disclosed
WO-2008140761-A2 BRANCHED POLYSILOXANE OF REDUCED MOLECULAR WEIGHT AND VISCOSITY MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-11-20 WO disclosed
US-20080276836-A1 Composition containing anti-misting component of reduced molecular weight and viscosity MOMENTIVE PERFORMANCE MATERIALS INC. 2008-11-13 US disclosed
US-20080281055-A1 Branched polysiloxane of reduced molecular weight and viscosity MOMENTIVE PERFORMANCE MATERIALS INC. 2008-11-13 US disclosed
WO-2008027497-A2 BRANCHED POLYSILOXANE COMPOSITION MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-03-06 WO disclosed
US-20080058491-A1 Branched polysiloxane composition GENERAL ELECTRIC COMPANY (US) 2008-03-06 US disclosed
WO-2008027494-A2 COMPOSITION CONTAINING ANTI-MISTING COMPONENT MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-03-06 WO disclosed
US-20080058479-A1 Composition containing anti-misting component GENERAL ELECTRIC COMPANY (US) 2008-03-06 US disclosed