⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12226185 | 0.82 | TSHR (0.39) | — | |
| SCHEMBL4526817 | 0.78 | TSHR (0.44) | — | |
| SCHEMBL3391286 | 0.75 | — | — | |
| SCHEMBL6064101 | 0.75 | TSHR (0.33) | — | |
| SCHEMBL3481505 | 0.73 | TSHR (0.37) | — | |
| SCHEMBL9911304 | 0.73 | — | — | |
| SCHEMBL12191045 | 0.73 | — | — | |
| SCHEMBL11672012 | 0.73 | — | — | |
| SCHEMBL11670472 | 0.73 | — | — | |
| SCHEMBL29054718 | 0.71 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4693927-A | MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT | FUJI PHOTO FILM COMPANY LIMITED (JP) | 1987-09-15 | — | — | US | claimed |
| CN-118843711-A | Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film | 东曹株式会社 | 2024-10-25 | — | — | CN | disclosed |
| EP-2057239-B1 | BRANCHED POLYSILOXANE COMPOSITION | MOMENTIVE PERFORMANCE MAT INC (US) | 2015-03-04 | — | — | EP | disclosed |
| EP-2057238-B1 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | MOMENTIVE PERFORMANCE MAT INC (US) | 2012-10-10 | — | — | EP | disclosed |
| CN-101535428-B | Composition containing anti-misting component | MOMENTIVE PERFORMANCE MAT INC | 2012-10-10 | — | — | CN | disclosed |
| CN-101535427-B | Branched polysiloxane composition | MOMENTIVE PERFORMANCE MAT INC | 2012-07-04 | — | — | CN | disclosed |
| US-7649071-B2 | Branched polysiloxane composition | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2010-01-19 | — | — | US | disclosed |
| CN-101535428-A | Composition containing anti-misting component | MOMENTIVE PERFORMANCE MAT INC (US) | 2009-09-16 | — | — | CN | disclosed |
| CN-101535427-A | Branched polysiloxane composition | MOMENTIVE PERFORMANCE MAT INC (US) | 2009-09-16 | — | — | CN | disclosed |
| US-7560167-B2 | branched polysiloxane component; paper release coating; high-speed coating processes | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2009-07-14 | — | — | US | disclosed |
| EP-2057239-A2 | BRANCHED POLYSILOXANE COMPOSITION | Momentive Performance Materials Inc. (US) | 2009-05-13 | — | — | EP | disclosed |
| EP-2057238-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | Momentive Performance Materials Inc. (US) | 2009-05-13 | — | — | EP | disclosed |
| WO-2008027497-A2 | BRANCHED POLYSILOXANE COMPOSITION | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080058479-A1 | Composition containing anti-misting component | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| WO-2008027494-A2 | COMPOSITION CONTAINING ANTI-MISTING COMPONENT | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20080058491-A1 | Branched polysiloxane composition | GENERAL ELECTRIC COMPANY (US) | 2008-03-06 | — | — | US | disclosed |
| US-4693927-A | MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT | FUJI PHOTO FILM COMPANY LIMITED (JP) | 1987-09-15 | — | — | US | disclosed |